SCHEMBL13287152

SCHEMBL13287152

CC(C)(C)C(=O)OC(F)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.39
ELANE P08246 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11183323 0.80
SCHEMBL2876682 0.79 PRKCA (0.38) PRKCA
SCHEMBL14510830 0.79
SCHEMBL12453254 0.79
SCHEMBL4378631 0.78 PRKCA (0.41) PRKCAELANE
SCHEMBL19742318 0.77 PRKCA (0.43) PRKCAELANE
SCHEMBL18924548 0.76 PRKCA (0.39) PRKCAELANE
SCHEMBL14510834 0.76
SCHEMBL4863907 0.75 TSHR (0.43)
SCHEMBL21749881 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7745104-B2 Polymer having a hydrocarbon chain backbone and containing units derived from norbornadiene, indene, benzofuran, benzothiophene, acenaphthene, or vinyl pyrene, fluorene, phenanthrene, chrysene, naphthacene, pentacene, or acenaphthene; excellent etching resistance; shorter wavelengths SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-29 US disclosed
US-20080038662-A1 Bottom resist layer composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-02-14 US disclosed