Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.41 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.35 |
| ▸ | CHRM3 | P20309 | 7/20 | 0.33 |
| ▸ | NAAA | Q02083 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12250059 | 0.98 | CYP19A1 (0.43) | CYP19A1EPHX1CHRM3NAAAHTT | |
| SCHEMBL14536168 | 0.79 | — | — | |
| SCHEMBL14536173 | 0.79 | CYP19A1 (0.41) | CYP19A1EPHX1CHRM3NAAAHTT | |
| SCHEMBL13557285 | 0.78 | CYP19A1 (0.43) | CYP19A1EPHX1CHRM3NAAAHTT | |
| SCHEMBL14536119 | 0.78 | CYP19A1 (0.38) | CYP19A1EPHX1CHRM3NAAAHTT | |
| SCHEMBL14536125 | 0.76 | CYP19A1 (0.40) | CYP19A1EPHX1CHRM3NAAAHTT | |
| SCHEMBL9913253 | 0.76 | CYP19A1 (0.41) | CYP19A1EPHX1CHRM3NAAAHTT | |
| SCHEMBL12801054 | 0.76 | — | — | |
| SCHEMBL14536329 | 0.74 | — | — | |
| SCHEMBL14536165 | 0.74 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2010061977-A2 | PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-06-03 | — | — | WO | disclosed |
| US-20070122741-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |