SCHEMBL13296307

SCHEMBL13296307

CC(C)C1OCC2(CO1)COC(C(C)(C)CO)OC2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16688170 0.88
SCHEMBL44322 0.87
SCHEMBL13588308 0.82
SCHEMBL16659345 0.80 KDM4E (0.33)
SCHEMBL18680192 0.80
SCHEMBL13312152 0.79
SCHEMBL19774783 0.79
SCHEMBL24171738 0.77
SCHEMBL2632401 0.77
SCHEMBL6983611 0.77 MEN1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3431479-B1 METHOD FOR PRODUCING DIOL HAVING CYCLIC ACETAL SKELETON MITSUBISHI GAS CHEMICAL CO (JP) 2020-08-26 EP disclosed
EP-3431479-B1 METHOD FOR PRODUCING DIOL HAVING CYCLIC ACETAL SKELETON MITSUBISHI GAS CHEMICAL CO (JP) 2020-08-26 EP disclosed
US-10370384-B2 Method for producing diol having cyclic acetal skeleton MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-08-06 US disclosed
US-10370384-B2 Method for producing diol having cyclic acetal skeleton MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-08-06 US disclosed
US-20190055259-A1 METHOD FOR PRODUCING DIOL HAVING CYCLIC ACETAL SKELETON MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-02-21 US disclosed
US-20190055259-A1 METHOD FOR PRODUCING DIOL HAVING CYCLIC ACETAL SKELETON MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-02-21 US disclosed
EP-3431479-A1 METHOD FOR PRODUCING DIOL HAVING CYCLIC ACETAL SKELETON Mitsubishi Gas Chemical Company, Inc. (JP) 2019-01-23 EP disclosed
EP-3431479-A1 METHOD FOR PRODUCING DIOL HAVING CYCLIC ACETAL SKELETON Mitsubishi Gas Chemical Company, Inc. (JP) 2019-01-23 EP disclosed
US-7728057-B2 Use of polymer powder containing UV absorber for the stabilisation of polymers against the effects of UV radiation BASF AKTIENGESELLSCHAFT (DE) 2010-06-01 US disclosed