⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL44322 | 0.89 | — | — | |
| SCHEMBL13588308 | 0.83 | — | — | |
| SCHEMBL12693592 | 0.83 | — | — | |
| SCHEMBL24171738 | 0.82 | — | — | |
| SCHEMBL16659345 | 0.81 | KDM4E (0.33) | — | |
| SCHEMBL19774783 | 0.80 | — | — | |
| SCHEMBL13312152 | 0.80 | — | — | |
| Triethylene Glycol SCHEMBL8401626 | 0.79 | MEN1 (0.37) | — | |
| SCHEMBL13296307 | 0.77 | — | — | |
| SCHEMBL12693998 | 0.76 | EPHX1 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120245264-A1 | POLYCARBONATE RESIN COMPOSITION AND MOLDED ARTICLE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-09-27 | — | — | US | disclosed |
| US-20120238679-A1 | POLYCARBONATE RESIN COMPOSITION AND MOLDED ARTICLE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20120232243-A1 | POLYCARBONATE RESINS AND PROCESSES FOR PRODUCING THE SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-09-13 | — | — | US | disclosed |
| US-20120232198-A1 | POLYCARBONATE RESIN COMPOSITION AND MOLDED ARTICLE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-09-13 | — | — | US | disclosed |
| US-8158981-B2 | Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-20110034646-A1 | PROCESS FOR PRODUCING POLYCARBONATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20110003101-A1 | PROCESSES FOR PRODUCING POLYCARBONATE AND MOLDED POLYCARBONATE ARTICLES | MITSUBISHI CHEMICAL CORPORATION (JP) | 2011-01-06 | — | — | US | disclosed |
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| EP-2223951-A1 | PROCESS FOR PRODUCTION OF POLYCARBONATE AND MOLDINGS OF POLYCARBONATE | Mitsubishi Chemical Corporation (JP) | 2010-09-01 | — | — | EP | disclosed |
| US-7776512-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| US-20100102321-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-04-29 | — | — | US | disclosed |
| US-20090207490-A1 | Retardation film and polyester resin for optical use | TORAY INDUSTRIES, INC. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090148791-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7435526-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| EP-1898238-A1 | RETARDATION FILM AND POLYESTER RESIN FOR OPTICAL USE | TORAY INDUSTRIES, INC. (JP) | 2008-03-12 | — | — | EP | disclosed |