SCHEMBL1330593

SCHEMBL1330593

[2H]C([2H])=C(C(=O)OC([2H])([2H])[2H])C([2H])([2H])[2H]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL18911579 0.92 ALDH1A1 (0.33)
SCHEMBL1332425 0.88
SCHEMBL17658972 0.85
SCHEMBL9013790 0.77
SCHEMBL9642204 0.70
Methacrylic Acid SCHEMBL10699451 0.69
SCHEMBL12432844 0.69
SCHEMBL4282413 0.69
SCHEMBL6536991 0.67 HTT (0.39)
SCHEMBL9641346 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0144712-A2 Optical fiber SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1985-06-19 EP claimed
US-20110282587-A1 COMPUTER READABLE STORAGE MEDIUMS, METHODS AND SYSTEMS FOR NORMALIZING CHEMICAL PROFILES IN BIOLOGICAL OR MEDICAL SAMPLES DETECTED BY MASS SPECTROMETRY EMORY UNIVERSITY (US) 2011-11-17 US disclosed
US-7375247-B2 Method for producing deuterated methyl methacrylate TAIYO NIPPON SANSO CORPORATION (JP) 2008-05-20 US disclosed
CN-100334146-C Transparent paramagnetic polymer DU PONT (US) 2007-08-29 CN disclosed
US-20070043242-A1 Method for producing deuterated methyl methacrylate NIPPON SANSO CORPORATION (JP) 2007-02-22 US disclosed
EP-1661880-A1 METHOD FOR PRODUCING DEUTERATED METHYL METHACRYLATE Taiyo Nippon Sanso Corporation (JP) 2006-05-31 EP disclosed
EP-1577909-A1 Optical responsive element E.I. du Pont de Nemours and Company (US) 2005-09-21 EP disclosed
EP-1577908-A1 Transparent paramagnetic polymer composition E.I. du Pont de Nemours and Company (US) 2005-09-21 EP disclosed
EP-1356478-B1 TRANSPARENT PARAMAGNETIC POLYMER DU PONT (US) 2005-06-01 EP disclosed
JP-2005082487-A MANUFACTURING METHOD OF DEUTERATED METHYL METHACRYLATE MITSUBISHI GAS CHEM CO INC 2005-03-31 JP disclosed
US-6741770-B2 Transparent paramagnetic polymer E. I. DU PONT DE NEMOURS AND COMPANY 2004-05-25 US disclosed
JP-2004010595-A NETHOD FOR PRODUCING DEUTERATED METHYL METHACRYLATE MITSUBISHI GAS CHEM CO INC 2004-01-15 JP disclosed
JP-2004010593-A METHOD FOR PRODUCING DEUTERATED ACETONE CYANOHYDRIN AND METHOD FOR PRODUCING DEUTERATED METHYL METHACRYLATE MITSUBISHI GAS CHEM CO INC 2004-01-15 JP disclosed
US-20030068439-A1 Transparent paramagnetic polymer E. I. DU PONT NEMOURS AND COMPANY 2003-04-10 US disclosed
US-20030069376-A1 Transparent paramagnetic polymer E. I. DU PONT DE NEMOURS AND COMPANY 2003-04-10 US disclosed
US-20030021524-A1 Transparent paramagnetic polymer E. I. DU PONT DE NEMOURS AND COMPANY 2003-01-30 US disclosed
EP-0467935-B1 TRANSPARENT THERMOPLASTIC MOULDING MATERIAL CONSISTING OF ESTERS OF 2,3-DIFLUORACRYLIC ACID HOECHST AG (DE) 1994-12-14 EP disclosed
WO-1990012040-A1 TRANSPARENT THERMOPLASTIC MOULDING MATERIAL CONSISTING OF ESTERS OF 2,3-DIFLUORACRYLIC ACID HOECHST AKTIENGESELLSCHAFT (DE) 1990-10-18 WO disclosed
EP-0144712-B1 OPTICAL FIBER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1988-03-30 EP disclosed
EP-0144712-A2 Optical fiber SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1985-06-19 EP disclosed