Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A2 | O15244 | 1/20 | 0.52 |
| ▸ | SLC47A1 | Q96FL8 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.39 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.39 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.39 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.39 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.39 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.39 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 5/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL136083 | 0.81 | SLC22A2 (0.48) | SLC22A2SLC47A1MAPTKMT2AMEN1 | |
| SCHEMBL14695859 | 0.78 | SLC22A2 (0.50) | SLC22A2SLC47A1MAPTKMT2AMEN1 | |
| SCHEMBL11636157 | 0.78 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTKMT2AMEN1 | |
| SCHEMBL135697 | 0.78 | SLC22A2 (0.45) | SLC22A2SLC47A1MAPTKMT2AMEN1 | |
| SCHEMBL14696061 | 0.78 | GRIN2D (0.67) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL14341531 | 0.78 | GRIN2D (0.39) | SLC22A2SLC47A1MAPTKMT2AMEN1 | |
| SCHEMBL14696758 | 0.78 | DPP4 (0.45) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| SCHEMBL1981155 | 0.77 | EPHX2 (0.51) | SLC22A2SLC47A1MAPTKMT2AMEN1 | |
| SCHEMBL1677909 | 0.76 | SLC22A2 (0.43) | SLC22A2SLC47A1MAPTKMT2AMEN1 | |
| SCHEMBL657960 | 0.73 | SLC22A2 (0.41) | SLC22A2SLC47A1MAPTKMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 197 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12030970-B2 | Curable composition and stereolithographic resin composition comprising same | KURARAY CO., LTD. (JP) | 2024-07-09 | — | — | US | disclosed |
| US-11814454-B2 | Curable composition, and resin composition for stereolithography prepared therefrom | KURARAY CO., LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| EP-4268792-A1 | ADHESIVE COMPOSITION FOR PHOTOFABRICATION ARTICLES | Kuraray Noritake Dental Inc. (JP) | 2023-11-01 | — | — | EP | disclosed |
| WO-2023190931-A1 | RESIN COMPOSITION FOR STEREOLITHOGRAPHY | クラレノリタケデンタル株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023182514-A1 | ADHESIVE COMPOSITION FOR STEREOLITHOGRAPHIC ARTICLE AND NON-STEREOLITHOGRAPHIC ARTICLE | クラレノリタケデンタル株式会社 | 2023-09-28 | — | — | WO | disclosed |
| CN-116669679-A | Adhesive composition for photo-molded article | 可乐丽则武齿科株式会社 | 2023-08-29 | — | — | CN | disclosed |
| WO-2023042915-A1 | STEREOLITHOGRAPHY PLATE DENTURE MANUFACTURING KIT, AND METHOD FOR MANUFACTURING PLATE DENTURE | クラレノリタケデンタル株式会社 | 2023-03-23 | — | — | WO | disclosed |
| WO-2023042912-A1 | METHOD FOR MANUFACTURING INTRAORAL APPLIANCE EQUIPPED WITH COATING, AND INTRAORAL APPLIANCE EQUIPPED WITH COATING | クラレノリタケデンタル株式会社 | 2023-03-23 | — | — | WO | disclosed |
| WO-2023042913-A1 | METHOD FOR PRODUCING DENTURE | クラレノリタケデンタル株式会社 | 2023-03-23 | — | — | WO | disclosed |
| EP-3991958-A1 | CURABLE COMPOSITION AND STEREOLITHOGRAPHIC RESIN COMPOSITION COMPRISING SAME | Kuraray Co., Ltd. (JP) | 2022-05-04 | — | — | EP | disclosed |
| US-20060014913-A1 | Star polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-01-19 | — | — | US | disclosed |
| EP-1258292-B1 | Oxidation catalytic system and oxidation process using same | DAICEL CHEM (JP) | 2004-05-19 | — | — | EP | disclosed |
| US-20040067436-A1 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |
| EP-0858835-B1 | Oxidation catalytic system and oxidation process | DAICEL CHEM (JP) | 2003-05-07 | — | — | EP | disclosed |
| EP-0824962-B1 | USE OF AN OXIDATION CATALYST SYSTEM AND PROCESS FOR OXIDATION WITH THE SAME | DAICEL CHEM (JP) | 2003-05-07 | — | — | EP | disclosed |
| EP-1258292-A1 | Oxidation catalytic system and oxidation process using same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-11-20 | — | — | EP | disclosed |
| US-5981420-A | OXIDATION CATALYSTS SYSTEM CONSISTS OF AN N-HYDROXY OR N-OXY IMIDE COMPOUND AND A TRANSITION METAL COMPOUND EXCLUDING A POLYACID AS COCATALYST | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1999-11-09 | — | — | US | disclosed |
| US-5958821-A | EPOXIDATION OF AN ALKENE USING A CYCLIC N-HYDROXYIMIDE AND A COCATALYST OF A COMPOUND OF A GROUP 2A OR TRANSITION METAL USING OXYGEN; CATALYST SELECTIVITY; FREE OF PHOSPHO-VANADOMOLYBDIC ACID OR TETRAPHENYLPORPHYRINTOATO MANGANESE | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1999-09-28 | — | — | US | disclosed |
| EP-0858835-A1 | Oxidation catalytic system and oxidation process | Daicel Chemical Industries, Ltd. (JP) | 1998-08-19 | — | — | EP | disclosed |
| EP-0824962-A1 | OXIDATION CATALYST SYSTEM AND PROCESS FOR OXIDATION WITH THE SAME | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1998-02-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11814454-B2 | Curable composition, and resin composition for stereolithography prepared therefrom | WASF2, COPE, ARCN1 | SLC22A2 2509/4885SLC47A1 4388/4885MAPT 1556/4885 |
| US-12030970-B2 | Curable composition and stereolithographic resin composition comprising same | ARL1, ASH2L, VCL | SLC22A2 4391/4885SLC47A1 4655/4885MAPT 2133/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.