SCHEMBL13327271

SCHEMBL13327271

CC(=O)N1CCN(C(=O)OCC2c3ccccc3-c3ccccc32)CC1

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.50
KMT2A Q03164 4/20 0.49
ALDH1A1 P00352 4/20 0.49
LMNA P02545 2/20 0.49
MEN1 O00255 2/20 0.49
MAPT P10636 2/20 0.49
CYP1A2 P05177 1/20 0.49
CYP3A4 P08684 1/20 0.49
CYP2C9 P11712 1/20 0.49
HPGD P15428 1/20 0.49
CYP2C19 P33261 1/20 0.49
FABP5 Q01469 3/20 0.45
FABP7 O15540 2/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
EPHX2 P34913 1/20 0.43
GAA P10253 2/20 0.42
ALOX15 P16050 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13327274 0.93 POLB (0.52) POLBKMT2AALDH1A1LMNAMEN1
SCHEMBL22397770 0.93 POLB (0.52) POLBKMT2AALDH1A1LMNAMEN1
SCHEMBL25330425 0.89 POLB (0.50) POLBKMT2AALDH1A1LMNAMEN1
SCHEMBL3219970 0.87 FABP5 (0.49) POLBKMT2AALDH1A1LMNAMAPT
SCHEMBL30555288 0.87 TSHR (0.50) POLBKMT2AALDH1A1LMNAFABP5
SCHEMBL8222797 0.87 TSHR (0.50) POLBKMT2AALDH1A1LMNAFABP5
SCHEMBL30824716 0.87 TSHR (0.50) POLBKMT2AALDH1A1LMNAFABP5
SCHEMBL30276687 0.85 TSHR (0.52) POLBKMT2AALDH1A1LMNAMEN1
SCHEMBL31220527 0.85 TSHR (0.52) POLBKMT2AALDH1A1LMNAMEN1
SCHEMBL711979 0.85 TSHR (0.52) POLBKMT2AALDH1A1LMNAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7718343-B2 Decomposable resin composition and pattern-forming material including the same FUJIFILM CORPORATION (JP) 2010-05-18 US disclosed
US-7718343-B2 Decomposable resin composition and pattern-forming material including the same FUJIFILM CORPORATION (JP) 2010-05-18 US disclosed
US-7402374-B2 Method for colored image formation FUJIFILM CORPORATION (JP) 2008-07-22 US disclosed
US-7402374-B2 Method for colored image formation FUJIFILM CORPORATION (JP) 2008-07-22 US disclosed
US-20080070154-A1 DECOMPOSABLE RESIN COMPOSITION AND PATTERN-FORMING MATERIAL INCLUDING THE SAME FUJIFILM CORPORATION (JP) 2008-03-20 US disclosed
US-20080070154-A1 DECOMPOSABLE RESIN COMPOSITION AND PATTERN-FORMING MATERIAL INCLUDING THE SAME FUJIFILM CORPORATION (JP) 2008-03-20 US disclosed