SCHEMBL13329928

SCHEMBL13329928

CC(=O)CC(CCN)CC(N)C(=O)O

nearest known ligand 0.53

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
SLC7A5 Q01650 1/20 0.45
GRIK1 P39086 7/20 0.44
SLC1A2 P43004 7/20 0.43
SLC1A3 P43003 6/20 0.43
SLC1A1 P43005 6/20 0.43
GRIK2 Q13002 6/20 0.43
GSR P00390 1/20 0.42
GABRR1 P24046 2/20 0.41
GRM1 Q13255 1/20 0.38
GRM2 Q14416 1/20 0.38
GGT1 P19440 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29067249 0.85 GSR (0.45) SLC7A5GRIK1SLC1A2SLC1A3SLC1A1
SCHEMBL29067251 0.85 GSR (0.45) SLC7A5GRIK1SLC1A2SLC1A3SLC1A1
SCHEMBL13329918 0.81 SLC7A5 (0.41) SLC7A5GRIK1SLC1A2SLC1A3SLC1A1
SCHEMBL6028073 0.77
SCHEMBL8244 0.77
SCHEMBL6027700 0.77
SCHEMBL30391170 0.75 GRIK1 (0.58) SLC7A5GRIK1SLC1A2SLC1A3SLC1A1
SCHEMBL28659265 0.75 GRIK1 (0.58) SLC7A5GRIK1SLC1A2SLC1A3SLC1A1
Hydrochloric Acid SCHEMBL376814 0.75 GRIK1 (0.58) SLC7A5GRIK1SLC1A2SLC1A3SLC1A1
Acetic Acid SCHEMBL6424774 0.73 GSR (0.60) GRIK1SLC1A2SLC1A3SLC1A1GRIK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7723234-B2 Method for selective CMP of polysilicon CLARKSON UNIVERSITY (US) 2010-05-25 US disclosed
US-7629258-B2 Method for one-to-one polishing of silicon nitride and silicon oxide CLARKSON UNIVERSITY (US) 2009-12-08 US disclosed
US-20090176371-A1 Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide CLARKSON UNIVERSITY (US) 2009-07-09 US disclosed
US-20080116172-A1 Method For One-To-One Polishing Of Silicon Nitride And Silicon Oxide CLARKSON UNIVERSITY (US) 2008-05-22 US disclosed
US-20080116171-A1 Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide CLARKSON UNIVERSITY (US) 2008-05-22 US disclosed
US-20080119051-A1 Method For Selective CMP Of Polysilicon CLARKSON UNIVERSITY (US) 2008-05-22 US disclosed