SCHEMBL13329918

SCHEMBL13329918

CNC(=O)CC(CCN)CC(N)C(=O)O

nearest known ligand 0.53

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
SLC7A5 Q01650 1/20 0.41
SLC1A1 P43005 6/20 0.40
SLC1A3 P43003 6/20 0.40
SLC1A2 P43004 6/20 0.40
GRIK1 P39086 3/20 0.40
GRIK2 Q13002 2/20 0.40
GSR P00390 1/20 0.39
GABRR1 P24046 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9949059 0.83 SLC7A5 (0.44) SLC7A5SLC1A1SLC1A3SLC1A2GRIK1
SCHEMBL13329928 0.81 SLC7A5 (0.45) SLC7A5SLC1A1SLC1A3SLC1A2GRIK1
SCHEMBL29067251 0.80 GSR (0.45) SLC7A5SLC1A1SLC1A3SLC1A2GRIK1
SCHEMBL29067249 0.80 GSR (0.45) SLC7A5SLC1A1SLC1A3SLC1A2GRIK1
SCHEMBL359673 0.80 SLC7A5 (0.50) SLC7A5SLC1A1SLC1A3SLC1A2GRIK1
SCHEMBL8368782 0.80 SLC7A5 (0.50) SLC7A5SLC1A1SLC1A3SLC1A2GRIK1
SCHEMBL515168 0.80 SLC7A5 (0.50) SLC7A5SLC1A1SLC1A3SLC1A2GRIK1
Glutamine SCHEMBL3192024 0.71 ALOX15 (0.66) SLC7A5SLC1A1SLC1A3SLC1A2GRIK1
Glutamine SCHEMBL3192030 0.71 ALOX15 (0.66) SLC7A5SLC1A1SLC1A3SLC1A2GRIK1
SCHEMBL6924307 0.69 GSR (0.48) SLC1A1SLC1A3SLC1A2GRIK1GRIK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7723234-B2 Method for selective CMP of polysilicon CLARKSON UNIVERSITY (US) 2010-05-25 US disclosed
US-7629258-B2 Method for one-to-one polishing of silicon nitride and silicon oxide CLARKSON UNIVERSITY (US) 2009-12-08 US disclosed
US-20090176371-A1 Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide CLARKSON UNIVERSITY (US) 2009-07-09 US disclosed
US-20080116172-A1 Method For One-To-One Polishing Of Silicon Nitride And Silicon Oxide CLARKSON UNIVERSITY (US) 2008-05-22 US disclosed
US-20080119051-A1 Method For Selective CMP Of Polysilicon CLARKSON UNIVERSITY (US) 2008-05-22 US disclosed
US-20080116171-A1 Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide CLARKSON UNIVERSITY (US) 2008-05-22 US disclosed