SCHEMBL133354

SCHEMBL133354

CCC(C)(CC(C)(CC(C)(CC(C)(CC(C)(CC(C)(CC(C)(CC(C)(CC(C)(CC(C)(C)C(=O)OC1CCCC1)C(=O)OC1CCCC1)C(=O)OC1CCCC1)C(=O)OC1CCCC1)C(=O)OC1CCCC1)C(=O)OC1CCCC1)C(=O)OC1CCCC1)C(=O)OC1CCCC1)C(=O)OC1CCCC1)C(=O)OC1CCCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.39
CYP19A1 P11511 1/20 0.38
NAAA Q02083 2/20 0.37
HTT P42858 2/20 0.33
CHRM3 P20309 5/20 0.32
CYP2C19 P33261 1/20 0.31
CHRM2 P08172 2/20 0.31
CHRM1 P11229 2/20 0.31
HRH1 P35367 2/20 0.31
KCNH2 Q12809 2/20 0.31
MLNR O43193 1/20 0.31
HTR2A P28223 1/20 0.31
HTR2C P28335 1/20 0.31
OPRM1 P35372 1/20 0.31
DRD3 P35462 1/20 0.31
OPRK1 P41145 1/20 0.31
HTR2B P41595 1/20 0.31
SLC6A3 Q01959 1/20 0.31
CACNA1C Q13936 1/20 0.31
FKBP1A P62942 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL131074 1.00 EPHX1 (0.39) EPHX1CYP19A1NAAAHTTCHRM3
SCHEMBL132522 1.00 EPHX1 (0.39) EPHX1CYP19A1NAAAHTTCHRM3
SCHEMBL131137 0.98 EPHX1 (0.41) EPHX1CYP19A1NAAAHTTCHRM3
SCHEMBL132092 0.98 EPHX1 (0.41) EPHX1CYP19A1NAAAHTTCHRM3
SCHEMBL131168 0.98 EPHX1 (0.41) EPHX1CYP19A1NAAAHTTCHRM3
SCHEMBL16200778 0.95 EPHX1 (0.44) EPHX1CYP19A1NAAAHTTCHRM3
SCHEMBL13805190 0.89 EPHX1 (0.45) EPHX1CYP19A1NAAAHTTCHRM3
SCHEMBL133266 0.87 APOBEC3A (0.41) CYP19A1HTTNPC1RAB9ASMN1; SMN2
SCHEMBL133127 0.87 APOBEC3A (0.41) CYP19A1HTTNPC1RAB9ASMN1; SMN2
SCHEMBL18233434 0.86 EPHX1 (0.41) EPHX1CYP19A1NAAAHTTCHRM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9052594-B2 Positive photosensitive composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2015-06-09 US disclosed
US-20120058431-A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2012-03-08 US disclosed