SCHEMBL133266

SCHEMBL133266

CCC(C)(CC(C)(CC(C)(CC(C)(CC(C)(C)C(=O)OC1CCC(C(C)(C)C)CC1)C(=O)OC1CCC(C(C)(C)C)CC1)C(=O)OC1CCC(C(C)(C)C)CC1)C(=O)OC1CCC(C(C)(C)C)CC1)C(=O)OC1CCC(C(C)(C)C)CC1

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
APOBEC3A P31941 1/20 0.41
APOBEC3G Q9HC16 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
HTT P42858 2/20 0.40
KDM4E B2RXH2 1/20 0.40
CYP19A1 P11511 1/20 0.39
MAPT P10636 2/20 0.39
GAA P10253 1/20 0.36
HSD11B1 P28845 1/20 0.32
LIPA P38571 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL133127 1.00 APOBEC3A (0.41) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A
SCHEMBL131074 0.87 EPHX1 (0.39) SMN1; SMN2NPC1RAB9AHTTCYP19A1
SCHEMBL133354 0.87 EPHX1 (0.39) SMN1; SMN2NPC1RAB9AHTTCYP19A1
SCHEMBL132522 0.87 EPHX1 (0.39) SMN1; SMN2NPC1RAB9AHTTCYP19A1
SCHEMBL18373347 0.86 APOBEC3A (0.48) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A
SCHEMBL131137 0.85 EPHX1 (0.41) SMN1; SMN2NPC1RAB9AHTTKDM4E
SCHEMBL132092 0.85 EPHX1 (0.41) SMN1; SMN2NPC1RAB9AHTTKDM4E
SCHEMBL131168 0.85 EPHX1 (0.41) SMN1; SMN2NPC1RAB9AHTTKDM4E
SCHEMBL107668 0.83 APOBEC3A (0.48) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A
SCHEMBL16200778 0.82 EPHX1 (0.44) SMN1; SMN2NPC1RAB9AHTTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9052594-B2 Positive photosensitive composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2015-06-09 US disclosed
US-20120058431-A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2012-03-08 US disclosed