Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 4/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | FDPS | P14324 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 3/20 | 0.34 |
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | PRKCA | P17252 | 1/20 | 0.32 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2843204 | 0.97 | DNM1 (0.43) | DNM1ALDH1A1TDP1TSHRLMNA | |
| SCHEMBL3808027 | 0.91 | DNM1 (0.46) | DNM1TSHRLMNAFDPSCA2 | |
| SCHEMBL2541482 | 0.91 | DNM1 (0.39) | DNM1ALDH1A1TDP1TSHRLMNA | |
| SCHEMBL3793387 | 0.88 | DNM1 (0.50) | DNM1TSHRLMNAFDPSCA2 | |
| SCHEMBL21175601 | 0.88 | DNM1 (0.50) | DNM1TSHRLMNAFDPSCA2 | |
| SCHEMBL6754668 | 0.88 | DNM1 (0.50) | DNM1TSHRLMNAFDPSCA2 | |
| SCHEMBL1931301 | 0.88 | DNM1 (0.50) | DNM1TSHRLMNAFDPSCA2 | |
| SCHEMBL1933190 | 0.88 | DNM1 (0.50) | DNM1TSHRLMNAFDPSCA2 | |
| SCHEMBL1932169 | 0.88 | DNM1 (0.50) | DNM1TSHRLMNAFDPSCA2 | |
| SCHEMBL8006167 | 0.88 | DNM1 (0.50) | DNM1TSHRLMNAFDPSCA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8859437-B2 | Solution for etching a thin film transistor and method of manufacturing the same | THE PENN STATE RESEARCH FOUNDATION (US) | 2014-10-14 | — | — | US | claimed |
| US-20140193945-A1 | SOLUTION FOR ETCHING A THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME | THE PENN STATE RESEARCH FOUNDATION | 2014-07-10 | — | — | US | claimed |
| EP-2122418-B1 | STRIPPER FOR COATING LAYER | AZ ELECTRONIC MATERIALS USA (US) | 2012-08-08 | — | — | EP | claimed |
| US-8026201-B2 | Comprising: a fluoride source, an organic quaternary ammonium base, and a solvent selected from an organic solvent, water, and mixtures thereof; for removing silicon-based anti-reflective coatings/hardmask layers from microelectronics; etch selectivity | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-09-27 | — | — | US | claimed |
| EP-2122418-A2 | STRIPPER FOR COATING LAYER | AZ Electronic Materials USA Corp. (US) | 2009-11-25 | — | — | EP | claimed |
| WO-2008081416-A2 | STRIPPER FOR COATING LAYER | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-07-10 | — | — | WO | claimed |
| US-20080161217-A1 | Stripper for Coating Layer | MERCK PATENT GMBH (DE) | 2008-07-03 | — | — | US | claimed |
| US-9663715-B2 | Polycrystalline texturing composition and method | SUN CHEMICAL CORPORATION (US) | 2017-05-30 | — | — | US | disclosed |
| US-20170069480-A9 | METHOD OF CLEANING AND MICRO-ETCHING SEMICONDUCTOR WAFERS | SUN CHEMICAL CORPORATION | 2017-03-09 | — | — | US | disclosed |
| US-20160225606-A1 | METHOD OF CLEANING AND MICRO-ETCHING SEMICONDUCTOR WAFERS | SUN CHEMICAL CORP (US) | 2016-08-04 | — | — | US | disclosed |
| US-9303207-B2 | Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2016-04-05 | — | — | US | disclosed |
| EP-2312618-B1 | Method of cleaning and micro-etching semiconductor wafers | ROHM & HAAS ELECT MAT (US) | 2016-02-10 | — | — | EP | disclosed |
| US-8859437-B2 | Solution for etching a thin film transistor and method of manufacturing the same | THE PENN STATE RESEARCH FOUNDATION (US) | 2014-10-14 | — | — | US | disclosed |
| US-5939208-A | FORMING A MULTILAYER ARTICLE FROM POLYMERS OF ACRYLIC OR METHACRYLIC ACID WITH TETRAALKYLAMMONIUM HYDROXIDE | BIOMIMETICS, INC. (US) | 1999-08-17 | — | — | US | disclosed |
| EP-0886547-A1 | CLEANING WAFER SUBSTRATES OF METAL CONTAMINATION WHILE MAINTAINING WAFER SMOOTHNESS | Mallinckrodt Baker, Inc. (US) | 1998-12-30 | — | — | EP | disclosed |
| WO-1998016330-A1 | CLEANING WAFER SUBSTRATES OF METAL CONTAMINATION WHILE MAINTAINING WAFER SMOOTHNESS | MALLINCKRODT BAKER, INC. (US) | 1998-04-23 | — | — | WO | disclosed |
| US-5498293-A | TREATMENT WITH ALKALINE SOLUTION AND AMPHOTERIC SURFACTANT | MALLINCKRODT BAKER, INC. (US) | 1996-03-12 | — | — | US | disclosed |
| EP-0690483-A2 | Cleaning wafer substrates of metal contamination while maintaining wafer smoothness | MALLINCKRODT BAKER, Inc. (US) | 1996-01-03 | — | — | EP | disclosed |
| US-5466389-A | Cleaning compounds with metal free base and surfactant | J. T. BAKER INC. (US) | 1995-11-14 | — | — | US | disclosed |
| EP-0678571-A2 | pH Adjusted nonionic surfactant containing alkaline cleaner composition for cleaning microelectronics substrates | MALLINCKRODT BAKER, Inc. (US) | 1995-10-25 | — | — | EP | disclosed |