Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.56 |
| ▸ | MAPT | P10636 | 6/20 | 0.56 |
| ▸ | NPC1 | O15118 | 3/20 | 0.56 |
| ▸ | RAB9A | P51151 | 3/20 | 0.56 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.56 |
| ▸ | GPR3 | P46089 | 1/20 | 0.54 |
| ▸ | POLB | P06746 | 3/20 | 0.49 |
| ▸ | LMNA | P02545 | 3/20 | 0.49 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.49 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | MAOA | P21397 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylamine SCHEMBL27887622 | 0.89 | KDM4E (0.55) | KDM4EALDH1A1MAPTNPC1RAB9A | |
| SCHEMBL10476774 | 0.89 | GPR3 (0.68) | KDM4EALDH1A1MAPTNPC1RAB9A | |
| SCHEMBL36332 | 0.89 | GPR3 (0.68) | KDM4EALDH1A1MAPTNPC1RAB9A | |
| SCHEMBL30515127 | 0.89 | GPR3 (0.68) | KDM4EALDH1A1MAPTNPC1RAB9A | |
| SCHEMBL9160474 | 0.89 | GPR3 (0.68) | KDM4EALDH1A1MAPTNPC1RAB9A | |
| SCHEMBL29374932 | 0.89 | GPR3 (0.68) | KDM4EALDH1A1MAPTNPC1RAB9A | |
| Chloromethane SCHEMBL28806374 | 0.86 | KDM4E (0.66) | KDM4EALDH1A1MAPTNPC1RAB9A | |
| Hydrogen Sulfide SCHEMBL23748456 | 0.86 | GPR3 (0.65) | KDM4EALDH1A1MAPTNPC1RAB9A | |
| Ammonia Solution, Strong SCHEMBL1871981 | 0.86 | GPR3 (0.65) | KDM4EALDH1A1MAPTNPC1RAB9A | |
| Dibenzothiophene SCHEMBL232234 | 0.86 | GPR3 (0.74) | KDM4EALDH1A1MAPTNPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3449 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122080620-A | Low-shrinkage photo-curing elastic resin composition based on synergistic compensation and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| US-12232338-B2 | Low-voltage operation dual-gate organic thin-film transistors and methods of manufacturing thereof | CORNING INCORPORATED (US) | 2025-02-18 | — | — | US | claimed |
| CN-119264336-A | Polybutadiene acrylate photosensitive resin composition with self-healing property and application thereof in 405nm photocuring 3D printing | 福建农林大学 | 2025-01-07 | — | — | CN | claimed |
| CN-118931467-A | High-adhesive-strength and high-water-resistance UV (ultraviolet) glue and preparation method thereof | 河源然生新材料有限公司 | 2024-11-12 | — | — | CN | claimed |
| EP-2445722-B2 | PRINTING METHOD | SERICOL LTD (GB) | 2024-09-04 | — | — | EP | claimed |
| CN-118459686-A | Photosensitive resin composition based on polybutadiene polyurethane acrylate and application of photosensitive resin composition in 405nm photocuring 3D printing | 泉州师范学院 | 2024-08-09 | — | — | CN | claimed |
| US-12048236-B2 | UV patternable polymer blends for organic thin-film transistors | CORNING INCORPORATED (US) | 2024-07-23 | — | — | US | claimed |
| CN-118192169-A | Photo-thermal curing 3D printing photosensitive resin composition and printing method thereof at 405nm | 杭州喜马拉雅信息科技有限公司 | 2024-06-14 | — | — | CN | claimed |
| CN-111138810-B | UV patternable polymer blend for organic thin film transistor | 康宁股份有限公司 | 2024-05-17 | — | — | CN | claimed |
| CN-117866149-A | Photosensitive resin composition based on ionic liquid and application of photosensitive resin composition in 405nm3D printing | 福州大学 | 2024-04-12 | — | — | CN | claimed |
| CN-1670112-A | Composition for forming an electron emission source and an electron emission source prepared therefrom | SAMSUNG SDI CO LTD (KR) | 2005-09-21 | — | — | CN | claimed |
| US-20050106496-A1 | Photosensitive material for non-substrate liquid crystal display | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2005-05-19 | — | — | US | claimed |
| EP-1117368-B1 | DENTAL COMPOSITION BASED ON SILICONE CROSSLINKABLE BY CATION PROCESS | RHODIA CHIMIE SA (FR) | 2004-05-06 | — | — | EP | claimed |
| CN-1437586-A | Triazine-based compound comprising functionalized alkylthio groups, and photo polymerization initiator | LG CHEMICAL LTD (KR) | 2003-08-20 | — | — | CN | claimed |
| EP-1117368-A1 | DENTAL COMPOSITION BASED ON SILICONE CROSSLINKABLE BY CATION PROCESS | RHODIA CHIMIE (FR) | 2001-07-25 | — | — | EP | claimed |
| WO-2000019967-A1 | DENTAL COMPOSITION BASED ON SILICONE CROSSLINKABLE BY CATION PROCESS | RHODIA CHIMIE (FR) | 2000-04-13 | — | — | WO | claimed |
| EP-0283990-B1 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO LTD (JP) | 1994-01-26 | — | — | EP | claimed |
| US-4996132-A | Heat-resistant photosensitive resin composition | TOYKO OHKA KOGYO CO. LTD. (JP) | 1991-02-26 | — | — | US | claimed |
| EP-0283990-A2 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1988-09-28 | — | — | EP | claimed |
| EP-0280295-A2 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1988-08-31 | — | — | EP | claimed |