Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 7/20 | 0.41 |
| ▸ | GABRB2 | P47870 | 7/20 | 0.41 |
| ▸ | GAA | P10253 | 3/20 | 0.36 |
| ▸ | CNR2 | P34972 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | CNR1 | P21554 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | AKR1B1 | P15121 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | PPARG | P37231 | 1/20 | 0.36 |
| ▸ | PPARD | Q03181 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 3/20 | 0.36 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.36 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.36 |
| ▸ | RXRA | P19793 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5824164 | 0.90 | GABRA1 (0.47) | GABRA1GABRB2MEN1MAPTKMT2A | |
| SCHEMBL8675962 | 0.88 | GABRA1 (0.44) | GABRA1GABRB2GAACNR2MEN1 | |
| SCHEMBL5548473 | 0.84 | GABRA1 (0.42) | GABRA1GABRB2GAACNR2MEN1 | |
| SCHEMBL10439799 | 0.83 | PTPRC (0.50) | GABRA1GABRB2GAAMEN1MAPT | |
| SCHEMBL1772134 | 0.82 | GABRA1 (0.41) | GABRA1GABRB2GAAMEN1MAPT | |
| Ethylene SCHEMBL27977906 | 0.82 | GABRA1 (0.41) | GABRA1GABRB2GAACNR2MEN1 | |
| SCHEMBL31290769 | 0.82 | GABRA1 (0.41) | GABRA1GABRB2MEN1MAPTKMT2A | |
| SCHEMBL454406 | 0.82 | GABRA1 (0.41) | GABRA1GABRB2MEN1MAPTKMT2A | |
| Hydrochloric Acid SCHEMBL6307100 | 0.80 | GABRA1 (0.39) | GABRA1GABRB2GAAMEN1MAPT | |
| SCHEMBL20819282 | 0.78 | CYP3A4 (0.48) | GABRA1GABRB2GAAMAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023195206-A1 | POLYIMIDE PRECURSOR COMPOSITION AND POLYIMIDE | ＪＦＥケミカル株式会社 | 2023-10-12 | — | — | WO | disclosed |
| US-10585079-B2 | Chlorine-concentration-measuring composition | KURITA WATER INDUSTRIES LTD. (JP) | 2020-03-10 | — | — | US | disclosed |
| US-9793483-B2 | Hexafluoroisopropanol group-containing diamine, polyimide and polyamide using same, cyclized product thereof, and method for producing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-10-17 | — | — | US | disclosed |
| US-20160377583-A1 | CHLORINE-CONCENTRATION-MEASURING COMPOSITION | KURITA WATER INDUSTRIES LTD. (JP) | 2016-12-29 | — | — | US | disclosed |
| EP-2716351-B1 | GAS SEPARATION MEMBRANE | CENTRAL GLASS CO LTD (JP) | 2016-06-29 | — | — | EP | disclosed |
| US-9061253-B2 | Gas separation membrane | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-06-23 | — | — | US | disclosed |
| US-9056285-B2 | Gas separation membrane | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-06-16 | — | — | US | disclosed |
| US-9050566-B2 | Gas separation membrane | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-06-09 | — | — | US | disclosed |
| US-8809451-B2 | Fluorinated dicarboxylic acid derivative and polymer obtained therefrom | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20140174293-A1 | Gas Separation Membrane | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-26 | — | — | US | disclosed |
| US-6949619-B2 | Phenolic hydroxyl-bearing polyimide resin, making method and polyimide resin composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-09-27 | — | — | US | disclosed |
| US-6808819-B2 | POLYIMIDE RESIN, EPOXY RESIN-CURING CATALYST, AND AN EPOXY RESIN | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2004-10-26 | — | — | US | disclosed |
| US-20040105990-A1 | Wafer dicing/die bonding sheet | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-03 | — | — | US | disclosed |
| US-20040019174-A1 | Phenolic hydroxyl-bearing polyimide resin, making method and polyimide resin composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-01-29 | — | — | US | disclosed |
| US-20030220455-A1 | Comprises epoxy resins and polyimides; for printed circuits and semiconductor packages | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-27 | — | — | US | disclosed |
| US-20030158350-A1 | Heat resistant resin composition and adhesive film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-08-21 | — | — | US | disclosed |
| EP-0659800-B1 | Polyimide precursor composition, polyimide composition and process for the production of said polyimide composition | CENTRAL GLASS CO LTD (JP) | 1999-06-23 | — | — | EP | disclosed |
| US-5840369-A | SCREEN PRINTING POLYIMIDE PRECURSOR INK ON SUBSTRATE, REMOVING SOLVENT, THERMALLY CURING INK TO FORM POLYIMIDE RELIEF PATTERN FILM | CENTRAL GLASS CO., LTD. (JP) | 1998-11-24 | — | — | US | disclosed |
| US-5686525-A | THIXOTROPIC SCREEN PRINTING INK COMPRISING A HEAT TREATED POLYAMIC ACID SOLUTION OBTAINED BY REACTION OF AROMATIC TETRACARBOXYLIC ACID, DIAMINE AND A MALEIMIDE; RELIEF IMAGES | CENTRAL GLASS COMPANY, LTD. (JP) | 1997-11-11 | — | — | US | disclosed |
| EP-0659800-A1 | Polyimide precursor composition, polyimide composition and process for the production of said polyimide composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 1995-06-28 | — | — | EP | disclosed |