Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 4/20 | 0.61 |
| ▸ | CA1 | P00915 | 4/20 | 0.61 |
| ▸ | CA2 | P00918 | 4/20 | 0.61 |
| ▸ | CA7 | P43166 | 4/20 | 0.61 |
| ▸ | CA9 | Q16790 | 4/20 | 0.61 |
| ▸ | CA14 | Q9ULX7 | 4/20 | 0.61 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.61 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.61 |
| ▸ | MYC | P01106 | 1/20 | 0.56 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.56 |
| ▸ | MEN1 | O00255 | 3/20 | 0.56 |
| ▸ | MAPT | P10636 | 3/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | LMNA | P02545 | 1/20 | 0.56 |
| ▸ | RAB9A | P51151 | 1/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.53 |
| ▸ | HTT | P42858 | 2/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30344092 | 1.00 | CA12 (0.61) | CA12CA1CA2CA7CA9 | |
| Hydrochloric Acid SCHEMBL18861034 | 0.98 | CA12 (0.59) | CA12CA1CA2CA7CA9 | |
| SCHEMBL10024268 | 0.84 | MCL1 (0.61) | KMT2AHSD17B10MCL1KDM4EESR2 | |
| SCHEMBL9216747 | 0.82 | HSD17B1 (0.47) | CA12CA1CA2CA7CA9 | |
| SCHEMBL39526 | 0.82 | CA12 (0.61) | CA12CA1CA2CA7CA9 | |
| SCHEMBL27500611 | 0.80 | CA12 (0.59) | CA12CA1CA2CA7CA9 | |
| SCHEMBL18861032 | 0.80 | CA12 (0.43) | CA12CA1CA2CA7CA9 | |
| SCHEMBL4950195 | 0.80 | TDP1 (0.47) | CA12CA1CA2CA7CA9 | |
| SCHEMBL27659033 | 0.80 | CA12 (0.59) | CA12CA1CA2CA7CA9 | |
| Hydroquinone SCHEMBL9845304 | 0.80 | CA12 (0.59) | CA12CA1CA2CA7CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 339 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230350293-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-11-02 | — | — | US | claimed |
| CN-116836081-A | Ether epoxy toughening agent and preparation method and application thereof | 中国林业科学研究院林产化学工业研究所 | 2023-10-03 | — | — | CN | claimed |
| EP-4220301-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | Young Chang Chemical Co., Ltd. (KR) | 2023-08-02 | — | — | EP | claimed |
| CN-116194842-A | Negative photoresist composition for I-line for improving step difference and LER between center and edge, and negative photoresist composition for I-line for improving process margin | 荣昌化学制品株式会社 | 2023-05-30 | — | — | CN | claimed |
| US-11586109-B2 | Chemically-amplified-type negative-type photoresist composition | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-02-21 | — | — | US | claimed |
| CN-109154776-B | Chemically amplified negative photoresist composition | 荣昌化学制品株式会社 | 2022-06-28 | — | — | CN | claimed |
| EP-3435160-B1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUTION AND HIGH ASPECT RATIO | YOUNG CHANG CHEMICAL CO LTD (KR) | 2022-05-04 | — | — | EP | claimed |
| WO-2022065713-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | 영창케미칼 주식회사 | 2022-03-31 | — | — | WO | claimed |
| CN-109073973-B | Negative photoresist composition for KrF laser with high resolution and high aspect ratio | 荣昌化学制品株式会社 | 2021-09-28 | — | — | CN | claimed |
| CN-107850841-B | Negative photoresist composition for KrF laser for forming semiconductor pattern | 荣昌化学制品株式会社 | 2021-04-02 | — | — | CN | claimed |
| EP-3435160-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUTION AND HIGH ASPECT RATIO | Young Chang Chemical Co., Ltd. (KR) | 2019-01-30 | — | — | EP | claimed |
| CN-109154776-A | Chemical amplifying type negative photoresist composition | 荣昌化学制品株式会社 | 2019-01-04 | — | — | CN | claimed |
| US-10162261-B2 | Negative photoresist composition for KrF laser for forming semiconductor patterns | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2018-12-25 | — | — | US | claimed |
| CN-109073973-A | KrF laser negative photoresist composition with high-resolution and high aspect ratio | 荣昌化学制品株式会社 | 2018-12-21 | — | — | CN | claimed |
| US-20180246404-A1 | I-LINE NEGATIVE TYPE PHOTORESIST COMPOSITION HAVING EXCELLENT ETCHING RESISTANCE | YCCHEM CO., LTD. (KR) | 2018-08-30 | — | — | US | claimed |
| US-20180203351-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER FOR FORMING SEMICONDUCTOR PATTERNS | YCCHEM CO., LTD. (KR) | 2018-07-19 | — | — | US | claimed |
| CN-107924124-A | Negative photoresist composition for I-line with excellent etching resistance | 荣昌化学制品株式会社 | 2018-04-17 | — | — | CN | claimed |
| CN-107850841-A | Negative photoresist composition for KrF laser for forming semiconductor pattern | 荣昌化学制品株式会社 | 2018-03-27 | — | — | CN | claimed |
| US-20110281115-A1 | CURABLE FILM-FORMING COMPOSITIONS CONTAINING ORTHO-HYDROXYL AROMATIC FUNCTIONAL ACRYLIC POLYMERS | PPG INDUSTRIES OHIO, INC. | 2011-11-17 | — | — | US | claimed |
| CN-102190585-A | Synthesis method of high-purity methyl 5-hydroxy-2-methyl benzoate | WUXI APPTEC CO LTD | 2011-09-21 | — | — | CN | claimed |