SCHEMBL133492

SCHEMBL133492

c1ccc(N(c2ccccc2)c2ccc3ccc4cccc5ccc2c3c45)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 6/20 0.46
ERBB2 P04626 1/20 0.46
FYN P06241 1/20 0.46
MAOA P21397 1/20 0.46
ACHE P22303 1/20 0.46
AHR P35869 1/20 0.46
ALDH1A1 P00352 8/20 0.45
HPGD P15428 5/20 0.45
HSD17B10 Q99714 4/20 0.45
THRB P10828 1/20 0.45
CYP3A4 P08684 4/20 0.44
TDP1 Q9NUW8 3/20 0.44
TSHR P16473 2/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
CYP1A1 P04798 1/20 0.42
CYP1B1 Q16678 1/20 0.42
KDM4E B2RXH2 5/20 0.37
KMT2A Q03164 3/20 0.37
CYP2D6 P10635 3/20 0.37
GLA P06280 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29558904 1.00 CYP1A2 (0.46) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL24054608 0.98 CYP1A2 (0.44) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL9239321 0.96 CYP1A2 (0.46) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL13320947 0.96 CYP1A2 (0.46) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL556985 0.94 ALDH1A1 (0.39) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL10066735 0.94 ALDH1A1 (0.39) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL9238800 0.93 CYP1A2 (0.44) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL13480626 0.92 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL14018336 0.92 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL13854569 0.92 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 400 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1403354-B1 1,3,6,8 tetrasubstituted pyrene compound, organic EL element using the same, and organic EL display using the same FUJIFILM CORP (JP) 2012-05-09 EP claimed
EP-1403354-A1 1,3,6,8 tetrasubstituted pyrene compound, organic EL element using the same, and organic EL display using the same FUJITSU LIMITED (JP) 2004-03-31 EP claimed
US-20040053069-A1 1,3,6,8-Tetrasubstituted pyrene compound, organic EL element using the same, and organic EL display using the same FUJITSU LIMITED (JP) 2004-03-18 US claimed
US-5672728-A FORMYLATION RICOH COMPANY, LTD. (JP) 1997-09-30 US claimed
JP-5301850-A None JP disclosed
JP-4261143-A None JP disclosed
CN-113845514-B Heterocyclic compound and organic electroluminescent device thereof 长春海谱润斯科技股份有限公司 2024-07-05 CN disclosed
EP-4075533-B1 ORGANIC COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE CANON KK (JP) 2024-07-03 EP disclosed
CN-114835608-B Organic compound, and organic light emitting diode and organic light emitting device including the same 乐金显示有限公司 2024-07-02 CN disclosed
CN-113831332-B Nitrogen-containing heterocyclic derivative and application thereof in organic electroluminescent device 长春海谱润斯科技股份有限公司 2024-06-18 CN disclosed
CN-115403508-B Triarylamine derivative and organic electroluminescent device thereof 长春海谱润斯科技股份有限公司 2024-06-11 CN disclosed
US-11997919-B2 Organic electric element, display panel comprising the same and display device comprising the same LG DISPLAY CO., LTD. (KR) 2024-05-28 US disclosed
US-5474868-A Having electroconductive support and a photoconductive layer containing charge generating material, charge transporting material and lignin; high quality image and excellent ozone resistance RICOH COMPANY, LTD. (JP) 1995-12-12 US disclosed
US-5459275-A Photoconductive layer on electroconductive substrate; electrography; durability, heat resistance, shockproof, flexibility RICOH COMPANY, LTD. (JP) 1995-10-17 US disclosed
US-5457232-A Photoconductive material for electrophotography RICOH COMPANY, LTD. (JP) 1995-10-10 US disclosed
US-5344985-A Photoconductors for electrophotography RICOH COMPANY, LTD. (JP) 1994-09-06 US disclosed
US-5292614-A Bis(triaminotriazine) MITSUBISHI KASEI CORPORATION (JP) 1994-03-08 US disclosed
US-5286600-A Negative photosensitive composition and method for forming a resist pattern by means thereof MITSUBISHI KASEI CORPORATION (JP) 1994-02-15 US disclosed
JP-H05301850-A NEW ALDEHYDE COMPOUND AND ITS PRODUCTION RICOH CO LTD 1993-11-16 JP disclosed
JP-H04261143-A PRODUCTION OF 1-N,N-DIPHENYLAMINOPYRENE DERIVATIVE RICOH CO LTD 1992-09-17 JP disclosed