⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18199006 | 0.84 | — | — | |
| SCHEMBL14865667 | 0.83 | CYP4F2 (0.32) | — | |
| SCHEMBL11991315 | 0.82 | — | — | |
| SCHEMBL16063439 | 0.81 | — | — | |
| SCHEMBL17252147 | 0.78 | GAA (0.32) | — | |
| SCHEMBL47526 | 0.75 | CYP4F2 (0.37) | — | |
| SCHEMBL11991314 | 0.75 | — | — | |
| SCHEMBL16167777 | 0.75 | — | — | |
| SCHEMBL17252151 | 0.75 | — | — | |
| SCHEMBL10203798 | 0.75 | CYP4F2 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8288072-B2 | Antireflection film; fast etching speed whcih reduces deformation; accuracy; 2,3-epoxypropyl methacrylate ester-styrene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |