SCHEMBL14865667

SCHEMBL14865667

CCC(C)(C)C(=O)OCC(OC)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.32
CYP4A11 Q02928 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13374682 0.83
SCHEMBL17252147 0.83 GAA (0.32) CYP4F2CYP4A11
SCHEMBL17252151 0.80
SCHEMBL16167777 0.80
SCHEMBL17676419 0.79 CYP4F2 (0.34) CYP4F2CYP4A11
SCHEMBL12939332 0.79 CYP4F2 (0.34) CYP4F2CYP4A11
SCHEMBL18199031 0.79 CYP4F2 (0.34) CYP4F2CYP4A11
SCHEMBL10181613 0.79 CYP4F2 (0.34) CYP4F2CYP4A11
SCHEMBL14770505 0.79 CYP4F2 (0.36) CYP4F2CYP4A11
SCHEMBL106916 0.79 HTT (0.45) CYP4F2CYP4A11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8889336-B2 Radiation-sensitive resin composition and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2014-11-18 US disclosed
US-20130260316-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORPORATION (JP) 2013-10-03 US disclosed
US-20130095428-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2013-04-18 US disclosed