Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | TP53 | P04637 | 3/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 3/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8735755 | 0.75 | — | — | |
| SCHEMBL15802756 | 0.71 | TSHR (0.41) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL301811 | 0.70 | GSTP1 (0.40) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL2556244 | 0.70 | HCAR2 (0.50) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL21913948 | 0.70 | TSHR (0.46) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL25402825 | 0.69 | TSHR (0.42) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL22009213 | 0.69 | THRB (0.43) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL13945599 | 0.69 | THRB (0.43) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL29577996 | 0.67 | THRB (0.53) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL10451653 | 0.67 | THRB (0.53) | TSHRALDH1A1TP53HIF1ACYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8288072-B2 | Antireflection film; fast etching speed whcih reduces deformation; accuracy; 2,3-epoxypropyl methacrylate ester-styrene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-7687228-B2 | Antireflection film composition and patterning process using the same | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |