Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.43 |
| ▸ | HPGD | P15428 | 5/20 | 0.43 |
| ▸ | GAA | P10253 | 3/20 | 0.42 |
| ▸ | PGR | P06401 | 1/20 | 0.42 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | NCEH1 | Q6PIU2 | 1/20 | 0.37 |
| ▸ | NQO1 | P15559 | 1/20 | 0.36 |
| ▸ | FABP7 | O15540 | 1/20 | 0.36 |
| ▸ | FABP3 | P05413 | 1/20 | 0.36 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.36 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.35 |
| ▸ | PTGES | O14684 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28157621 | 0.98 | ALDH1A1 (0.42) | ALDH1A1KDM4EHSD17B10HPGDGAA | |
| SCHEMBL27835057 | 0.86 | ELANE (0.42) | ALDH1A1KDM4EHSD17B10HPGDGAA | |
| SCHEMBL1336291 | 0.86 | ALDH1A1 (0.57) | ALDH1A1KDM4EHSD17B10HPGDGAA | |
| SCHEMBL6836791 | 0.86 | ALDH1A1 (0.57) | ALDH1A1KDM4EHSD17B10HPGDGAA | |
| SCHEMBL27818241 | 0.85 | ELANE (0.41) | ALDH1A1KDM4EHSD17B10HPGDGAA | |
| SCHEMBL7134423 | 0.84 | ELANE (0.46) | ALDH1A1KDM4EHSD17B10HPGDGAA | |
| SCHEMBL29420740 | 0.84 | ELANE (0.46) | ALDH1A1KDM4EHSD17B10HPGDGAA | |
| SCHEMBL29733276 | 0.83 | ELANE (0.45) | ALDH1A1KDM4EHSD17B10HPGDGAA | |
| SCHEMBL29733360 | 0.83 | ELANE (0.45) | ALDH1A1KDM4EHSD17B10HPGDGAA | |
| SCHEMBL29733196 | 0.83 | ELANE (0.45) | ALDH1A1KDM4EHSD17B10HPGDGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117866135-A | Self-crosslinking polymer and bottom anti-reflection coating composition as well as preparation method and application thereof | 厦门恒坤新材料科技股份有限公司 | 2024-04-12 | — | — | CN | claimed |
| CN-102114708-A | Method and device for continuously preparing organic polymer optical fiber with refractive index gradually changing along radial direction | CHINESE ACAD TECH INST PHYSICS | 2011-07-06 | — | — | CN | claimed |
| CN-1266843-A | Organic antireflecting coating and its preparation | HYUNDAI ELECTRONICS IND (KR) | 2000-09-20 | — | — | CN | claimed |
| CN-115989251-A | Composition comprising an additive having polycyclic aromatic groups | 伊英克公司 | 2023-04-18 | — | — | CN | disclosed |
| US-11372330-B2 | Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-06-28 | — | — | US | disclosed |
| CN-110537147-A | Photosensitive polymer combination | NISSAN CHEMICAL IND LTD | 2019-12-03 | — | — | CN | disclosed |
| CN-110537146-A | Photosensitive resin composition | NISSAN CHEMICAL CORP | 2019-12-03 | — | — | CN | disclosed |
| CN-110494807-A | The resist lower membrane formation composition containing silicon with carbonyl structure | NISSAN CHEMICAL CORP | 2019-11-22 | — | — | CN | disclosed |
| CN-110461964-A | Cured film is formed with composition, orientation material and phase difference material | NISSAN CHEMICAL CORP | 2019-11-15 | — | — | CN | disclosed |
| CN-110461887-A | Cured film is formed with composition, orientation material and phase difference material | NISSAN CHEMICAL CORP | 2019-11-15 | — | — | CN | disclosed |
| CN-110461965-A | Cured film is formed with composition, orientation material and phase difference material | NISSAN CHEMICAL CORP | 2019-11-15 | — | — | CN | disclosed |
| CN-101517492-A | Method for producing transparent cured film using positive photosensitive resin layer for half exposure | NISSAN CHEMICAL IND LTD (JP) | 2009-08-26 | — | — | CN | disclosed |
| CN-101506736-A | Resist underlayer film forming composition containing liquid additive | NISSAN CHEMICAL IND LTD (JP) | 2009-08-12 | — | — | CN | disclosed |
| US-20090035704-A1 | Underlayer Coating Composition Based on a Crosslinkable Polymer | AZ ELECTRONIC MATERIALS USA CORP. | 2009-02-05 | — | — | US | disclosed |
| EP-1923433-A2 | Encapsulating resin composition and light-emitting device | Sony Chemical & Information Device Corporation (JP) | 2008-05-21 | — | — | EP | disclosed |
| US-20080114100-A1 | Encapsulating resin composition and light-emitting device | SONY CHEMICAL & INFORMATION DEVICE CORPORATION (JP) | 2008-05-15 | — | — | US | disclosed |
| CN-1991581-A | Hardmask composition coated under photoresist and process of producing integrated circuit devices using thereof | CHEIL IND INC (KR) | 2007-07-04 | — | — | CN | disclosed |
| CN-1828420-A | Coating compositions for use with an overcoated photoresist | ROHM & HAAS ELECT MAT (US) | 2006-09-06 | — | — | CN | disclosed |
| CN-1550889-A | Multilayer photoresist system | 希普雷公司 | 2004-12-01 | — | — | CN | disclosed |
| CN-1542546-A | Multilayer photoresist system | ϣ | 2004-11-03 | — | — | CN | disclosed |