SCHEMBL13383282

SCHEMBL13383282

C=C1CCCCC(C)CO1

nearest known ligand 0.37

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA4 P22748 1/20 0.37
KMT2A Q03164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1106722 0.84
SCHEMBL13938662 0.76
SCHEMBL179200 0.74 CYP2D6 (0.50) CA1CA2CA4KMT2A
SCHEMBL18268908 0.74 CYP2D6 (0.50) CA1CA2CA4KMT2A
SCHEMBL3822239 0.72 CYP2D6 (0.49) CA1CA2CA4KMT2A
SCHEMBL8846065 0.72 CYP2D6 (0.49) CA1CA2CA4KMT2A
SCHEMBL547347 0.72 CYP2D6 (0.49) CA1CA2CA4KMT2A
SCHEMBL15577086 0.72 CYP2D6 (0.49) CA1CA2CA4KMT2A
SCHEMBL3821804 0.72 CYP2D6 (0.49) CA1CA2CA4KMT2A
SCHEMBL2719598 0.72 CYP2D6 (0.49) CA1CA2CA4KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2177506-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND USED IN THE COMPOSITION Fujifilm Corporation (JP) 2010-04-21 EP disclosed
WO-2009113735-A1 RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-09-17 WO disclosed