⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13414794 | 0.87 | — | — | |
| SCHEMBL21122753 | 0.85 | TSHR (0.39) | — | |
| SCHEMBL13414809 | 0.85 | — | — | |
| SCHEMBL13414801 | 0.84 | — | — | |
| SCHEMBL13414776 | 0.82 | — | — | |
| SCHEMBL13414806 | 0.82 | CA2 (0.34) | — | |
| SCHEMBL13414797 | 0.81 | PRSS1 (0.32) | — | |
| SCHEMBL13414789 | 0.79 | — | — | |
| SCHEMBL13414792 | 0.78 | — | — | |
| SCHEMBL21235248 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7687228-B2 | Antireflection film composition and patterning process using the same | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |