SCHEMBL13422016

SCHEMBL13422016

CCOC(=O)CCN(CCC(=O)OC)CCC(=O)OC

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.57
MEN1 O00255 1/20 0.57
GAA P10253 2/20 0.50
MGAM O43451 1/20 0.50
SI P14410 1/20 0.50
MGAM2 Q2M2H8 1/20 0.50
TSHR P16473 4/20 0.48
ALDH1A1 P00352 2/20 0.46
TRPA1 O75762 1/20 0.46
KDM5A P29375 2/20 0.46
CYP1A2 P05177 1/20 0.45
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
POLB P06746 2/20 0.40
LMNA P02545 1/20 0.40
MAPK1 P28482 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL66021 0.91 ALDH1A1 (0.54) KMT2AMEN1GAAMGAMSI
SCHEMBL14182352 0.91 KMT2A (0.48) KMT2AMEN1GAAMGAMSI
SCHEMBL2001291 0.89 ALDH1A1 (0.52) KMT2AMEN1GAAMGAMSI
SCHEMBL64783 0.87 KMT2A (0.65) KMT2AMEN1GAAMGAMSI
SCHEMBL17705606 0.85 KMT2A (0.43) KMT2AMEN1GAAMGAMSI
SCHEMBL13756007 0.85 CYP1A2 (0.52) KMT2AGAAMGAMSIMGAM2
SCHEMBL10257448 0.85 ALDH1A1 (0.48) KMT2AMEN1GAAMGAMSI
SCHEMBL2055295 0.84 KMT2A (0.62) KMT2AMEN1GAAMGAMSI
SCHEMBL2055299 0.84 KMT2A (0.62) KMT2AMEN1GAAMGAMSI
SCHEMBL12791521 0.84 KMT2A (0.62) KMT2AMEN1GAAMGAMSI

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7670750-B2 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-02 US disclosed
US-7670750-B2 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-02 US disclosed