SCHEMBL13445844

SCHEMBL13445844

CC1(C)CCCC(C)(C)C1OCCl

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
UGT2B7 P16662 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10305808 0.79 ALDH1A1 (0.32) UGT2B7
SCHEMBL12972052 0.75 UGT2B7 (0.35) UGT2B7
SCHEMBL10447407 0.67 ALDH1A1 (0.35)
SCHEMBL9259050 0.67 CYP3A4 (0.31)
SCHEMBL17995327 0.67
SCHEMBL7778992 0.66 UGT2B7 (0.36) UGT2B7
SCHEMBL9259045 0.65 UGT2B7 (0.32) UGT2B7
SCHEMBL9466680 0.64 MAPK1 (0.32) UGT2B7
SCHEMBL21279730 0.64 CYP3A4 (0.32)
SCHEMBL12972049 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7687222-B2 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-30 US disclosed
US-7687222-B2 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-30 US disclosed
US-20080008962-A1 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-01-10 US disclosed
US-20080008962-A1 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-01-10 US disclosed