Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.32 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.30 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.30 |
| ▸ | DPP4 | P27487 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL107130 | 0.87 | NPSR1 (0.36) | NPSR1CYP17A1CYP19A1DPP8DPP9 | |
| SCHEMBL14883979 | 0.86 | NPSR1 (0.36) | NPSR1CYP17A1CYP19A1DPP8DPP9 | |
| SCHEMBL14883977 | 0.86 | NPSR1 (0.36) | NPSR1CYP17A1CYP19A1DPP8DPP9 | |
| SCHEMBL14883985 | 0.85 | NPSR1 (0.33) | NPSR1CYP17A1CYP19A1DPP4 | |
| SCHEMBL14883982 | 0.84 | NPSR1 (0.32) | NPSR1CYP17A1CYP19A1DPP4 | |
| SCHEMBL17370219 | 0.84 | NPSR1 (0.32) | NPSR1CYP17A1CYP19A1 | |
| SCHEMBL12932666 | 0.83 | NPSR1 (0.37) | NPSR1CYP17A1CYP19A1DPP8DPP9 | |
| SCHEMBL106971 | 0.83 | CYP17A1 (0.34) | NPSR1CYP17A1CYP19A1DPP8DPP9 | |
| SCHEMBL106192 | 0.81 | CYP17A1 (0.38) | NPSR1CYP17A1CYP19A1DPP8DPP9 | |
| SCHEMBL106316 | 0.80 | ALDH1A1 (0.42) | NPSR1CYP17A1CYP19A1DPP8DPP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8940476-B2 | Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film | FUJIFILM CORPORATION (JP) | 2015-01-27 | — | — | US | disclosed |
| US-20120264054-A1 | PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-10-18 | — | — | US | disclosed |