SCHEMBL13464645

SCHEMBL13464645

O=C(OCCCOC(F)(F)C(F)(F)S(=O)(=O)O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.38
KMT2A Q03164 3/20 0.38
NPSR1 Q6W5P4 3/20 0.38
MEN1 O00255 2/20 0.38
MAPT P10636 2/20 0.38
PRKCA P17252 1/20 0.37
PKM P14618 1/20 0.36
CYP17A1 P05093 2/20 0.36
CYP19A1 P11511 2/20 0.36
ATM Q13315 1/20 0.36
GAA P10253 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
EPHX2 P34913 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18051619 0.97 ALDH1A1 (0.38) ALDH1A1KMT2ANPSR1MEN1MAPT
SCHEMBL14240735 0.92 ALDH1A1 (0.40) ALDH1A1KMT2ANPSR1MEN1MAPT
SCHEMBL14226621 0.90 NPSR1 (0.34) ALDH1A1KMT2ANPSR1MEN1MAPT
SCHEMBL14226615 0.88 ALDH1A1 (0.44) ALDH1A1NPSR1GAASMN1; SMN2
SCHEMBL14240732 0.87 NPSR1 (0.34) ALDH1A1KMT2ANPSR1MEN1MAPT
SCHEMBL14240731 0.87 ALDH1A1 (0.40) ALDH1A1KMT2ANPSR1MEN1MAPT
SCHEMBL14226524 0.86 MEN1 (0.32) ALDH1A1KMT2AMEN1ATM
SCHEMBL14241051 0.85 ALDH1A1 (0.39) ALDH1A1KMT2ANPSR1MEN1MAPT
SCHEMBL13447505 0.83 NPSR1 (0.42) ALDH1A1KMT2ANPSR1MEN1MAPT
SCHEMBL13464642 0.82 ALDH1A1 (0.35) ALDH1A1KMT2ANPSR1MEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9428485-B2 Salt, photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-30 US disclosed
US-9428485-B2 Salt, photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-30 US disclosed
US-8753796-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-06-17 US disclosed
US-20120315580-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-12-13 US disclosed
US-20120315580-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-12-13 US disclosed
US-20120264055-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-10-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120315580-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN H1-10, H1-0, C1S ALDH1A1 2221/4885KMT2A 1504/4885NPSR1 179/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.