Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.62 |
| ▸ | CA2 | P00918 | 5/20 | 0.39 |
| ▸ | CA1 | P00915 | 4/20 | 0.39 |
| ▸ | CNR1 | P21554 | 1/20 | 0.36 |
| ▸ | CNR2 | P34972 | 1/20 | 0.36 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.35 |
| ▸ | IDO1 | P14902 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | GRIA1 | P42261 | 3/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13477464 | 0.84 | EPHX1 (0.52) | EPHX1CA2CA1CNR1CNR2 | |
| SCHEMBL1260720 | 0.80 | EPHX1 (0.64) | EPHX1CA2CA1CNR1CNR2 | |
| SCHEMBL7870212 | 0.78 | EPHX1 (0.62) | EPHX1CA2CA1CNR1CNR2 | |
| SCHEMBL1321109 | 0.78 | EPHX1 (0.96) | EPHX1CA2CA1CA7 | |
| SCHEMBL1260722 | 0.78 | EPHX1 (0.62) | EPHX1CA2CA1CNR1CNR2 | |
| SCHEMBL12789664 | 0.78 | EPHX1 (0.60) | EPHX1CA2CA1CNR1CNR2 | |
| SCHEMBL15904262 | 0.77 | EPHX1 (0.61) | EPHX1CA2CA1CNR1CNR2 | |
| SCHEMBL1319040 | 0.77 | EPHX1 (1.00) | EPHX1CA2CA1CA7 | |
| SCHEMBL1319861 | 0.77 | EPHX1 (1.00) | EPHX1CA2CA1CA7 | |
| SCHEMBL1318327 | 0.77 | EPHX1 (1.00) | EPHX1CA2CA1CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7666572-B2 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-02-23 | — | — | US | disclosed |
| US-7666572-B2 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-02-23 | — | — | US | disclosed |
| US-20070298355-A1 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| US-20070298355-A1 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |