Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | ESR1 | P03372 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | ALOX5AP | P20292 | 1/20 | 0.39 |
| ▸ | KCNN4 | O15554 | 4/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | ELANE | P08246 | 2/20 | 0.38 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.37 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.37 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.37 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.37 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.37 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.37 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzene SCHEMBL27450268 | 0.85 | TSHR (0.49) | ALDH1A1ALOX15MAPTKMT2AALOX5AP | |
| Hydrogen Peroxide SCHEMBL8974942 | 0.84 | TDP1 (0.46) | ALDH1A1ESR1MAPTNPSR1ELANE | |
| SCHEMBL5242160 | 0.82 | MAPT (0.50) | ALDH1A1ALOX15ESR1CYP3A4ESR2 | |
| SCHEMBL28980762 | 0.82 | NPC1 (0.47) | ALDH1A1ESR1CYP3A4ESR2MAPT | |
| SCHEMBL27492791 | 0.82 | TSHR (0.61) | ALDH1A1MAPTKMT2ACYP2C19NPSR1 | |
| SCHEMBL29448528 | 0.82 | MAPT (0.44) | ALDH1A1MAPTNPSR1ELANETDP1 | |
| SCHEMBL30090914 | 0.82 | ALDH1A1 (0.50) | ALDH1A1ALOX15ESR1CYP3A4ESR2 | |
| SCHEMBL5955915 | 0.82 | ALDH1A1 (0.50) | ALDH1A1ALOX15ESR1CYP3A4ESR2 | |
| SCHEMBL14976 | 0.82 | MAPT (0.44) | ALDH1A1MAPTNPSR1ELANETDP1 | |
| SCHEMBL28872220 | 0.81 | MAPK1 (0.47) | ALDH1A1ALOX15ESR1CYP3A4ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8063245-B2 | Phosphazene compound, photosensitive resin composition and use thereof | KANEKA CORPORATION (JP) | 2011-11-22 | — | — | US | disclosed |
| US-20100218984-A1 | PHOTOSENSITIVE DRY FILM RESIST, PRINTED WIRING BOARD MAKING USE OF THE SAME, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD | KANEKA CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-7141614-B2 | Photosensitive resin composition and photosensitive films and laminates made by using the same | KANEKA CORPORATION (JP) | 2006-11-28 | — | — | US | disclosed |
| US-20060199920-A1 | Photosensitive resin composition capable of being developed with aqueous developer and photosensitive dry film resist, and use thereof | KANEKA CORPORATION (JP) | 2006-09-07 | — | — | US | disclosed |
| US-20060142542-A1 | Phosphazene compound, photosensitive resin composition and use thereof | KANEKA CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| US-20040265731-A1 | Photosensitive resin composition and photosensitive films and laminates made by using the same | KANEKA CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-20040235992-A1 | Photosensitive resin composition and photosensitive dry film resist and photosensitive coverlay film produced therefrom | KANEKA CORPORATION (JP) | 2004-11-25 | — | — | US | disclosed |
| US-20040048978-A1 | Photosensitive resin composition, solder resist comprising the same, cover lay film, and printed circuit board | KANEKA CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| US-6605353-B2 | Polyimide derived from a dianhydride and diamine having hydroxyl or carboxyl groups, which are modified with a diepoxide or unsaturated group-containing epoxide; curable; heat resistance, dielectric, film-forming | KANEKA CORPORATION (JP) | 2003-08-12 | — | — | US | disclosed |
| US-20010056174-A1 | Epoxy-modified polyimide, photosensitive composition, coverlay film, solder resist, and printed wiring board using the epoxy-modified polyimide | KANEKA CORPORATION (JP) | 2001-12-27 | — | — | US | disclosed |
| WO-2000068192-A2 | PROCESS FOR THE PREPARATION OF (DI)ALKYLPEROXY ESTERS OF (DI)CARBOXYLIC ACIDS | AKZO NOBEL N.V. (NL) | 2000-11-16 | — | — | WO | disclosed |
| EP-0180789-B1 | CROSS-LINKING OF STYRENE POLYMERS | Luperox GmbH (DE) | 1990-02-28 | — | — | EP | disclosed |
| EP-0180789-A1 | Cross-linking of styrene polymers | Luperox GmbH (DE) | 1986-05-14 | — | — | EP | disclosed |
| US-4075236-A | FROM ACID CHLORIDE, A HYDROPEROXIDE AND AN ALKALI METAL HYDROXIDE | PENNWALT CORPORATION (US) | 1978-02-21 | — | — | US | disclosed |