Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13324800 | 0.85 | KDM4E (0.41) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL13486936 | 0.83 | KDM4E (0.42) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL15362623 | 0.82 | KDM4E (0.41) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL75457 | 0.81 | KDM4E (0.38) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL3676593 | 0.81 | KDM4E (0.38) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL3680032 | 0.81 | KDM4E (0.38) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL12577685 | 0.81 | KDM4E (0.41) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL18714193 | 0.81 | KDM4E (0.38) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL19380643 | 0.81 | KDM4E (0.38) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL15805635 | 0.81 | KDM4E (0.38) | KDM4EALDH1A1MEN1KMT2ACYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100047712-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-02-25 | — | — | US | disclosed |
| US-7608390-B2 | Photoresists; for immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-10-27 | — | — | US | disclosed |
| US-20080032228-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-07 | — | — | US | disclosed |