SCHEMBL75457

SCHEMBL75457

OC(CC1CC2C=CC1C2)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 9/20 0.38
ALDH1A1 P00352 4/20 0.38
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 1/20 0.35
ATM Q13315 1/20 0.35
TDP1 Q9NUW8 2/20 0.35
HTT P42858 1/20 0.34
TSHR P16473 1/20 0.33
PKM P14618 1/20 0.31
LMNA P02545 1/20 0.31
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19380643 1.00 KDM4E (0.38) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL18714193 1.00 KDM4E (0.38) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL3680032 1.00 KDM4E (0.38) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL3676593 1.00 KDM4E (0.38) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL15805635 1.00 KDM4E (0.38) KDM4EALDH1A1MEN1KMT2ACYP1A2
Alcohol SCHEMBL2512964 0.93 KDM4E (0.41) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL118602 0.82 KDM4E (0.39) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL18713286 0.82 KDM4E (0.36) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL8402175 0.82 KDM4E (0.36) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL13324800 0.81 KDM4E (0.41) KDM4EALDH1A1MEN1KMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1062 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109313388-B Negative photosensitive composition 住友电木株式会社 2022-06-21 CN claimed
CN-114555674-A Photosensitive composition and application thereof 普罗米鲁斯有限责任公司 2022-05-27 CN claimed
US-10591818-B2 Nadic anhydride polymers and photosensitive compositions derived therefrom PROMERUS, LLC (US) 2020-03-17 US claimed
US-10303057-B2 Fluorine free photopatternable phenol functional group containing polymer compositions PROMERUS, LLC (US) 2019-05-28 US claimed
US-20180329299-A1 FLUORINE FREE PHOTOPATTERNABLE PHENOL FUNCTIONAL GROUP CONTAINING POLYMER COMPOSITIONS SUMITOMO BAKELITE CO., LTD. (JP) 2018-11-15 US claimed
US-10054854-B2 Fluorine free photopatternable phenol functional group containing polymer compositions PROMERUS, LLC (US) 2018-08-21 US claimed
WO-2018022952-A1 NADIC ANHYDRIDE POLYMERS AND PHOTOSENSITIVE COMPOSITIONS DERIVED THEREFROM PROMERUS, LLC (US) 2018-02-01 WO claimed
US-20180030189-A1 NADIC ANHYDRIDE POLYMERS AND PHOTOSENSITIVE COMPOSITIONS DERIVED THEREFROM PROMERUS, LLC (US) 2018-02-01 US claimed
US-20170097566-A1 FLUORINE FREE PHOTOPATTERNABLE PHENOL FUNCTIONAL GROUP CONTAINING POLYMER COMPOSITIONS SUMITOMO BAKELITE CO., LTD. (JP) 2017-04-06 US claimed
US-8753790-B2 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom PROMERUS, LLC (US) 2014-06-17 US claimed
US-20050202351-A1 Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof CLARIANT INTERNATIONAL LTD. (CH) 2005-09-15 US claimed
US-20050192409-A1 Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof PROMERUS, LLC 2005-09-01 US claimed
US-20040229157-A1 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof PROMERUS LLC 2004-11-18 US claimed
US-6794110-B2 DEVELOPMENT OF LATENT IMAGES INTERNATIONAL BUSINESS MACHINES CORPORATION 2004-09-21 US claimed
WO-2004076495-A2 VINYL ADDITION POLYCYCLIC OLEFIN POLYMERS PREPARED WITH NON-OLEFINIC CHAIN TRANSFER AGENTS AND USES THEREOF PROMERUS LLC (US) 2004-09-10 WO claimed
WO-2004074928-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-09-02 WO claimed
US-20040166434-A1 Photoresist composition for deep ultraviolet lithography AZ ELECTRONIC MATERIALS USA CORP. 2004-08-26 US claimed
US-20040166433-A1 Photoresist composition for deep ultraviolet lithography AZ ELECTRONIC MATERIALS USA CORP. 2004-08-26 US claimed
WO-2004041760-A2 FLUORINATED POLYMERS HONEYWELL INTERNATIONAL INC. (US) 2004-05-21 WO claimed
US-20040091813-A1 Fluorinated polymers HONEYWELL INTERNATIONAL INC. 2004-05-13 US claimed