SCHEMBL1349068

SCHEMBL1349068

CCC(Cl)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22731 1.00
Hydrochloric Acid SCHEMBL28758144 0.95
Hydrochloric Acid SCHEMBL28494481 0.95
Fluoride SCHEMBL28117511 0.95
Hydrochloric Acid SCHEMBL28491434 0.95
Methylene Chloride SCHEMBL11424623 0.91
SCHEMBL28183968 0.87
SCHEMBL9405117 0.87 TSHR (0.33)
1,1,2,2-Tetrachloroethane SCHEMBL9405116 0.83 TDP1 (0.39)
SCHEMBL9116421 0.80 THRB (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109153653-B Novel compound, photocurable composition, cured product thereof, printing ink, and printed matter using the printing ink DIC株式会社 2022-06-28 CN disclosed
US-11079675-B2 Compound, photocurable composition, cured product of same, printing ink, and printed matter curing the printing ink DIC CORPORATION (JP) 2021-08-03 US disclosed
CN-111954848-A Photosensitive resin composition, cured product, insulating material, resin material for solder resist, and resist member DIC株式会社 2020-11-17 CN disclosed
WO-2019198490-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, INSULATING MATERIAL, RESIN MATERIAL FOR SOLDER RESISTS AND RESIST MEMBER DIC株式会社 2019-10-17 WO disclosed
US-20190137872-A1 NOVEL COMPOUND, PHOTOCURABLE COMPOSITION, CURED PRODUCT OF SAME, PRINTING INK, AND PRINTED MATTER SURING THE PRINTING INK DIC CORPORATION (JP) 2019-05-09 US disclosed
US-8461346-B2 Benzyl amines, a process for their production and their use as anti-inflammatory agents BAYER PHARMA AKTIENGESELLSCHAFT (DE) 2013-06-11 US disclosed
US-20120289510-A1 Benzyl Amines, A Process For Their Production And Their Use As Anti-Inflammtory Agents ASTRAZENECA AB (SE) 2012-11-15 US disclosed
WO-2012025578-A3 AN APPLICATOR FOR APPLYING A COSMETIC COMPOSITION AND A COSMETIC PACKAGING INCLUDING SUCH AN APPLICATOR ALBEA SERVICES (FR) 2012-05-10 WO disclosed
US-8173676-B2 Benzyl, amines, a process for their production and their use as anti-inflammatory agents Bayer Pharma AG (DE) 2012-05-08 US disclosed
EP-2041069-B1 BENZYL AMINES, A PROCESS FOR THEIR PRODUCTION AND THEIR USE AS ANTI-INFLAMMATORY AGENTS Bayer Pharma AG (DE) 2011-11-30 EP disclosed
WO-2008101840-A1 COMBINATION OF ERLOTINIB AND MEK-INHIBITORS FOR INHIBITING PROLIFERATION OF TUMOR CELLS F. HOFFMANN-LA ROCHE AG (CH) 2008-08-28 WO disclosed
US-20080032986-A1 BENZYL AMINES, A PROCESS FOR THEIR PRODUCTION AND THEIR USE AS ANTI-INFLAMMATORY AGENTS BAYER INTELLECTUAL PROPERTY GMBH (DE) 2008-02-07 US disclosed
EP-1878717-A1 Benzyl amines, a process for their production and their use as anti-inflammatory agents Bayer Schering Pharma Aktiengesellschaft (DE) 2008-01-16 EP disclosed
US-20070197617-A1 Substituted hydantoins CHEN SHAOQING 2007-08-23 US disclosed
US-20050089716-A1 Light-emitting compound and polymer, and luminescent element HIROSE ENGINEERING CO., LTD. (JP) 2005-04-28 US disclosed
EP-1516903-A1 Light-emitting compound and polymer and luminescent element HIROSE ENGINEERING CO., LTD. (JP) 2005-03-23 EP disclosed
US-6509367-B1 Pyrazole cannabinoid agonist and antagonists VIRGINIA COMMONWEALTH UNIVERSITY 2003-01-21 US disclosed
US-6238752-B1 MODIFIED DIAMINE CHISSO CORPORATION (JP) 2001-05-29 US disclosed
EP-1020442-A1 NOVEL DIAMINO COMPOUNDS, POLYAMIC ACID, POLYIMIDE, LIQUID-CRYSTAL ALIGNMENT FILM MADE FROM FILM OF THE POLYIMIDE, AND LIQUID-CRYSTAL DISPLAY ELEMENT CONTAINING THE ALIGNMENT FILM Chisso Corporation (JP) 2000-07-19 EP disclosed
US-6090909-A Uv-ray-dimerized high molecular compound, liquid crystal aligning film using above high molecular compound and liquid crystal display element using above aligning film CHISSO CORPORATION (JP) 2000-07-18 US disclosed