Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | PTGDR | Q13258 | 1/20 | 0.36 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.36 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.35 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.35 |
| ▸ | RXRA | P19793 | 1/20 | 0.34 |
| ▸ | FOLH1 | Q04609 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 2/20 | 0.34 |
| ▸ | DCLRE1A | Q6PJP8 | 1/20 | 0.34 |
| ▸ | DCLRE1B | Q9H816 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | ELANE | P08246 | 1/20 | 0.33 |
| ▸ | SRD5A1 | P18405 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL996835 | 0.90 | CYP1A2 (0.44) | GAATSHRKDM4ESMN1; SMN2HSD17B10 | |
| SCHEMBL299374 | 0.86 | SELL (0.41) | GAATSHRKDM4ESMN1; SMN2HSD17B10 | |
| SCHEMBL18915 | 0.86 | GAA (0.38) | GAATSHRKDM4ESMN1; SMN2HSD17B10 | |
| SCHEMBL243841 | 0.86 | GAA (0.38) | GAATSHRKDM4ESMN1; SMN2HSD17B10 | |
| Water SCHEMBL3696709 | 0.84 | GAA (0.37) | GAATSHRKDM4ESMN1; SMN2HSD17B10 | |
| SCHEMBL8895803 | 0.84 | KDM4E (0.43) | GAATSHRKDM4ESMN1; SMN2HSD17B10 | |
| SCHEMBL2361001 | 0.84 | GABRA1 (0.46) | GAATSHRKDM4ESMN1; SMN2HSD17B10 | |
| SCHEMBL2183664 | 0.84 | PTGDR (0.35) | GAATSHRKDM4ESMN1; SMN2HSD17B10 | |
| SCHEMBL1348042 | 0.84 | GABRA1 (0.34) | GAATSHRKDM4ESMN1; SMN2HSD17B10 | |
| SCHEMBL30581210 | 0.83 | ELANE (0.44) | GAAKDM4EALDH1A1MAPTELANE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2004048463-A1 | POLYMERIC COMPOSITIONS RAPIDLY HEATABLE UNDER ELECTROMAGNETIC IRRADIATION, THEIR USES AND PROCESSING METHODS | PARODI FABRIZIO (IT) | 2004-06-10 | — | — | WO | claimed |
| US-6537411-B1 | Method for low temperature lamination of metals to polyimides | THE NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2003-03-25 | — | — | US | claimed |
| CN-119213364-A | Photosensitive resin composition, method for producing polyimide cured film using same, and polyimide cured film | 旭化成株式会社 | 2024-12-27 | — | — | CN | disclosed |
| US-8865110-B2 | Method for producing graphite film and graphite film produced by the method | KANEKA CORPORATION (JP) | 2014-10-21 | — | — | US | disclosed |
| CN-103524735-A | Photosensitive polyimide | ETERNAL CHEMICAL CO LTD | 2014-01-22 | — | — | CN | disclosed |
| US-8585998-B2 | Method for producing graphite film, and graphite film produced by the method | KANEKA CORPORATION (JP) | 2013-11-19 | — | — | US | disclosed |
| CN-102532544-B | Photosensitive polyimide | ETERNAL CHEMICAL CO LTD | 2013-10-09 | — | — | CN | disclosed |
| US-8063245-B2 | Phosphazene compound, photosensitive resin composition and use thereof | KANEKA CORPORATION (JP) | 2011-11-22 | — | — | US | disclosed |
| CN-101414122-B | Photosensitive polyimide | ETERNAL CHEMICAL INDUSTRY CO LTD | 2011-09-14 | — | — | CN | disclosed |
| US-20100218984-A1 | PHOTOSENSITIVE DRY FILM RESIST, PRINTED WIRING BOARD MAKING USE OF THE SAME, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD | KANEKA CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| CN-101492538-A | Photosensitive polyimide | ETERNAL CHEMICAL CO LTD (CN) | 2009-07-29 | — | — | CN | disclosed |
| US-20080050305-A1 | Method for Producing Graphite Film, and Graphite Film Produced By the Method | KANEKA CORPORATION (JP) | 2008-02-28 | — | — | US | disclosed |
| US-7141614-B2 | Photosensitive resin composition and photosensitive films and laminates made by using the same | KANEKA CORPORATION (JP) | 2006-11-28 | — | — | US | disclosed |
| US-20040265731-A1 | Photosensitive resin composition and photosensitive films and laminates made by using the same | KANEKA CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| WO-2004048463-A1 | POLYMERIC COMPOSITIONS RAPIDLY HEATABLE UNDER ELECTROMAGNETIC IRRADIATION, THEIR USES AND PROCESSING METHODS | PARODI FABRIZIO (IT) | 2004-06-10 | — | — | WO | disclosed |