SCHEMBL13513643

SCHEMBL13513643

CO[Si](C)(O[Si](C)(OC)C1CC2CCC1C2)C1CC2CCC1C2

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
SLC6A3 Q01959 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL301670 0.92 SLC6A3 (0.32) SLC6A3
SCHEMBL13513663 0.91
SCHEMBL17485826 0.82
SCHEMBL13513612 0.79 SLC6A3 (0.32) SLC6A3
SCHEMBL1130112 0.77 SLC6A3 (0.33) SLC6A3
SCHEMBL431942 0.77
SCHEMBL1130547 0.77 SLC6A3 (0.33) SLC6A3
SCHEMBL15544311 0.75 PDGFRB (0.32) SLC6A3
SCHEMBL5832133 0.74 EPHX2 (0.33)
SCHEMBL25442790 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7645557-B2 Positive resist composition for immersion exposure and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-01-12 US disclosed
US-20070065753-A1 Positive resist composition for immersion exposure and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-22 US disclosed