Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.68 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.54 |
| ▸ | USP2 | O75604 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL29094792 | 0.97 | TDP1 (0.65) | TDP1HSD17B10USP2HTT | |
| SCHEMBL437182 | 0.95 | TDP1 (0.69) | TDP1HSD17B10USP2HTT | |
| SCHEMBL28728852 | 0.95 | TDP1 (0.69) | TDP1HSD17B10USP2HTT | |
| SCHEMBL27954020 | 0.95 | TDP1 (0.69) | TDP1HSD17B10USP2HTT | |
| SCHEMBL1478045 | 0.95 | TDP1 (0.69) | TDP1HSD17B10USP2HTT | |
| SCHEMBL12762780 | 0.95 | TDP1 (0.63) | TDP1HSD17B10USP2HTT | |
| SCHEMBL429656 | 0.95 | TDP1 (0.69) | TDP1HSD17B10USP2HTT | |
| SCHEMBL95614 | 0.95 | TDP1 (0.61) | TDP1HSD17B10USP2HTTSPHK1 | |
| Ammonia Solution, Strong SCHEMBL29094807 | 0.93 | TDP1 (0.67) | TDP1HSD17B10USP2HTT | |
| SCHEMBL1478603 | 0.91 | TDP1 (0.64) | TDP1HSD17B10USP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1838 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250257242-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2025-08-14 | — | — | US | claimed |
| CN-119613347-A | Saflufenacil herb method for synthesizing amine | 永农生物科学有限公司 | 2025-03-14 | — | — | CN | claimed |
| US-20240218293-A1 | CLEANING AGENT COMPOSITION AND CLEANING METHOD | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-04 | — | — | US | claimed |
| US-11866676-B2 | Cleaning agent composition and cleaning method | NISSAN CHEMICAL CORPORATION (JP) | 2024-01-09 | — | — | US | claimed |
| CN-114027309-B | Iodine-containing disinfectant containing polyvinylpyrrolidone and polyalcohol ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2023-04-25 | — | — | CN | claimed |
| CN-114208818-B | Iodine-containing disinfectant containing polyol ether and/or cyclic ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2022-10-04 | — | — | CN | claimed |
| US-20220145218-A1 | CLEANING AGENT COMPOSITION AND CLEANING METHOD | NISSAN CHEMICAL CORPORATION (JP) | 2022-05-12 | — | — | US | claimed |
| CN-114208818-A | Iodine-containing disinfectant containing polyol ether and/or cyclic ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2022-03-22 | — | — | CN | claimed |
| CN-114027309-A | Iodine-containing disinfectant containing polyvinylpyrrolidone and polyol ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2022-02-11 | — | — | CN | claimed |
| CN-113439325-A | Cleaning agent composition and cleaning method | 日产化学株式会社 | 2021-09-24 | — | — | CN | claimed |
| US-7182841-B2 | Purification of solvents used for the purification of alkylene oxide | HUNTSMAN INTERNATIONAL LLC (US) | 2007-02-27 | — | — | US | claimed |
| WO-2004094346-A2 | PURIFICATION OF SOLVENTS USED FOR THE PURIFICATION OF ALKYLENE OXIDE | HUNTSMAN INTERNATIONAL LLC (US) | 2004-11-04 | — | — | WO | claimed |
| US-20040211658-A1 | Purification of solvents used for the purification of alkylene oxide | HUNTSMAN PETROCHEMICAL COMPANY | 2004-10-28 | — | — | US | claimed |
| CN-1137285-C | Metal paste and method for production of metal film | О | 2004-02-04 | — | — | CN | claimed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| US-6197366-B1 | ELECTROCONDUCTIVE METAL FILM FROM LOW TEMPERATURE BAKING FROMNITRATE SALT AND CYANO COMPOUND, CARBONYL COMPOUND OR ORGANIC SALT OF METAL AND AMINO | TAKAMATSU RESEARCH LABORATORY (JP) | 2001-03-06 | — | — | US | claimed |
| CN-1254385-A | Metal paste and method for producing metal film | TAKAMATSU RESEARCH LAB (JP) | 2000-05-24 | — | — | CN | claimed |
| EP-0989205-A1 | METAL PASTE AND METHOD FOR PRODUCTION OF METAL FILM | Takamatsu Research Laboratory (JP) | 2000-03-29 | — | — | EP | claimed |
| US-5916729-A | A POSITIVE TONE TYPE REISTS CONSISTS OF A RESIN WHICH HAS AN ACIDIC FUNCTIONAL GROUP PROTECTED BY AN ACID DECOMPOSABLE GROUP AND IS HYDROLYZABLE, A PHOTOACID GENERATOR AND A SOLVENT MIXTURE OF ALKYL LACTATE WITH PROPYLENE GLYCOL ETHER | JSR CORPORATION (JP) | 1999-06-29 | — | — | US | claimed |
| US-5512198-A | WEAR RESISTANCE | NIPPON OIL CO., LTD. (JP) | 1996-04-30 | — | — | US | claimed |