Methacrylic Acid

Methacrylic Acid

SCHEMBL135474

C=C(C)C(=O)O.CC(CO)(CO)CO

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 1/20 0.38
TDP1 Q9NUW8 1/20 0.35
TGFBR1 P36897 1/20 0.34
ALDH1A1 P00352 2/20 0.31
HMGCR P04035 1/20 0.31
CHRM1 P11229 1/20 0.31
TBXA2R P21731 1/20 0.31
ADRA1A P35348 1/20 0.31
TSHR P16473 1/20 0.30
FFAR3 O14843 1/20 0.30
LCK P06239 1/20 0.30
FYN P06241 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL1625645 1.00 TET2 (0.38) TET2TDP1TGFBR1ALDH1A1HMGCR
Methacrylic Acid SCHEMBL31533290 1.00 TET2 (0.38) TET2TDP1TGFBR1ALDH1A1HMGCR
Methacrylic Acid SCHEMBL8383575 1.00 TET2 (0.38) TET2TDP1TGFBR1ALDH1A1HMGCR
Methacrylic Acid SCHEMBL7760915 1.00 TET2 (0.38) TET2TDP1TGFBR1ALDH1A1HMGCR
Methacrylic Acid SCHEMBL1494603 1.00 TET2 (0.38) TET2TDP1TGFBR1ALDH1A1HMGCR
Methacrylic Acid SCHEMBL51595 1.00 TET2 (0.38) TET2TDP1TGFBR1ALDH1A1HMGCR
Methacrylic Acid SCHEMBL11681478 0.97 TET2 (0.37) TET2TDP1TGFBR1FFAR3LCK
Methacrylic Acid SCHEMBL27965582 0.95 TET2 (0.35) TET2TDP1TGFBR1ALDH1A1
Methacrylic Acid SCHEMBL9635441 0.93 TET2 (0.34) TET2TDP1TGFBR1
Succinic Acid SCHEMBL1654074 0.91 LMNA (0.42) TET2TGFBR1HMGCRCHRM1TBXA2R

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 526 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220151907-A1 PERSONAL CARE COMPOSITIONS LAMBERTI SPA (IT) 2022-05-19 US claimed
EP-0835282-B1 IMPROVED PHENOLIC SCORCH RETARDERS SARTOMER CO INC (US) 2003-04-09 EP claimed
WO-2002083743-A1 WATER-SOLUBLE POLYMER COMPLEXES WSP CHEMICALS & TECHNOLOGY LLC (US) 2002-10-24 WO claimed
EP-0835282-A1 IMPROVED PHENOLIC SCORCH RETARDERS SARTOMER COMPANY, INC. (US) 1998-04-15 EP claimed
EP-0494679-B1 Heat-shrinkable tubing and process for producing the same SUMITOMO ELECTRIC INDUSTRIES (JP) 1998-04-08 EP claimed
US-5696190-A CURABLE ELASTOMERS MIXED WITH AN ACID SALT OF (DI)ALKYLAMINOALKYL PHENOL SARTOMER COMPANY (US) 1997-12-09 US claimed
WO-1997001597-A1 IMPROVED PHENOLIC SCORCH RETARDERS SARTOMER COMPANY, INC. (US) 1997-01-16 WO claimed
US-5298300-A Heat-shrinkable tubing and process for producing the same SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1994-03-29 US claimed
EP-0494679-A1 Heat-shrinkable tubing and process for producing the same SUMITOMO ELECTRIC INDUSTRIES, LIMITED (JP) 1992-07-15 EP claimed
US-4509163-A Process for producing a low hygroscopic methacrylic resin and information recording substrates made therefrom MITSUBISHI RAYON CO., LTD. (JP) 1985-04-02 US claimed
JP-2059325-A None JP disclosed
JP-1263108-A None JP disclosed
JP-1263105-A None JP disclosed
EP-4004075-B1 AQUEOUS CATIONIC POLYURETHANE DISPERSIONS AGFA NV (BE) 2026-03-11 EP disclosed
US-12180375-B2 Aqueous cationic polyurethane dispersions AGFA NV (BE) 2024-12-31 US disclosed
EP-0158478-A2 Methacrylic resin molding material and method for production thereof Kuraray Co., Ltd. (JP) 1985-10-16 EP disclosed
US-4509163-A Process for producing a low hygroscopic methacrylic resin and information recording substrates made therefrom MITSUBISHI RAYON CO., LTD. (JP) 1985-04-02 US disclosed
EP-0097948-A2 Information recording substrate MITSUBISHI RAYON CO., LTD. (JP) 1984-01-11 EP disclosed
US-4206025-A IRRADIATION POLYMERIZATION U C B, SOCIETE ANONYME (BE) 1980-06-03 US disclosed
JP-H00259325-A 0001-01-01 JP disclosed