SCHEMBL1356953

SCHEMBL1356953

CC(C)([O])OC1CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.36
CA2 P00918 3/20 0.36
ACHE P22303 1/20 0.35
CA12 O43570 2/20 0.34
CA9 Q16790 2/20 0.34
EPHX1 P07099 2/20 0.33
CYP19A1 P11511 1/20 0.33
NPC1 O15118 1/20 0.31
HTT P42858 1/20 0.31
RAB9A P51151 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
NAAA Q02083 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1357594 0.97 ACHE (0.32) CA1CA2ACHECA12CA9
SCHEMBL1357031 0.78 ACHE (0.32) CA1CA2ACHEEPHX1CYP19A1
SCHEMBL11625556 0.78 CA1 (0.33) CA1CA2ACHECA12CA9
SCHEMBL7184843 0.78 CA1 (0.33) CA1CA2ACHECA12CA9
SCHEMBL13696645 0.78 CA1 (0.33) CA1CA2ACHECA12CA9
SCHEMBL12166804 0.78 CA1 (0.33) CA1CA2ACHECA12CA9
SCHEMBL190490 0.78 CA1 (0.33) CA1CA2ACHECA12CA9
SCHEMBL9623348 0.78 CA1 (0.33) CA1CA2ACHECA12CA9
SCHEMBL191513 0.75 ACHE (0.30) ACHE
SCHEMBL24616685 0.74 CA1 (0.36) CA1CA2ACHECA12CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114488688-A Liquid crystal display element, method for producing same, and radiation-sensitive resin composition JSR株式会社 2022-05-13 CN disclosed
US-20110281040-A1 LIQUID CRYSTAL DISPLAY ELEMENT, POSITIVE TYPE RADIATION SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND FORMATION METHOD THEREOF JSR CORPORATION (JP) 2011-11-17 US disclosed
EP-0793144-B1 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 2001-01-17 EP disclosed
US-5962180-A COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT JSR CORPORATION (JP) 1999-10-05 US disclosed
EP-0793144-A2 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-09-03 EP disclosed