SCHEMBL1357211

SCHEMBL1357211

CC(C)(C)OC(OC(C)(C)C)[SiH2]O

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703796 0.67 ALDH1A1 (0.30) ALDH1A1
SCHEMBL704562 0.67
SCHEMBL15333441 0.66 CYP3A4 (0.30)
SCHEMBL703789 0.63
SCHEMBL15310080 0.63
SCHEMBL17678920 0.62 ALDH1A1 (0.38) ALDH1A1
SCHEMBL2738725 0.62
SCHEMBL3439787 0.62 ALDH1A1 (0.38) ALDH1A1
SCHEMBL225306 0.61
SCHEMBL22714174 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119913498-A Improved polymer inhibitors for regioselective deposition ASM IP私人控股有限公司 2025-05-02 CN disclosed
US-20250137118-A1 POLYMERIC INHIBITOR FOR AREA SELECTIVE DEPOSITION ASM IP HOLDING B.V. (NL) 2025-05-01 US disclosed
CN-119663227-A Selective deposition of inhibitor material and deposition assembly ASM IP私人控股有限公司 2025-03-21 CN disclosed
CN-119673750-A Selective deposition of organic polymeric materials and deposition assemblies ASM IP私人控股有限公司 2025-03-21 CN disclosed
US-20250092510-A1 SELECTIVE DEPOSITION OF INHIBITOR MATERIAL AND A DEPOSITION ASSEMBLIES ASM IP HOLDING B.V. (NL) 2025-03-20 US disclosed
US-20250092509-A1 SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES ASM IP HOLDING B.V. (NL) 2025-03-20 US disclosed
US-8536070-B2 Vapor deposition of silicon dioxide nanolaminates PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2013-09-17 US disclosed
US-20110281417-A1 VAPOR DEPOSITION OF SILICON DIOXIDE NANOLAMINATES PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2011-11-17 US disclosed
US-8008743-B2 Vapor deposition of silicon dioxide nanolaminates PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2011-08-30 US disclosed
US-20080032064-A1 Selective sealing of porous dielectric materials PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2008-02-07 US disclosed
US-20050112282-A1 Vapor deposition of silicon dioxide nanolaminates PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2005-05-26 US disclosed
EP-1490529-A1 VAPOR DEPOSITION OF SILICON DIOXIDE NANOLAMINATES PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2004-12-29 EP disclosed
WO-2003083167-A1 VAPOR DEPOSITION OF SILICON DIOXIDE NANOLAMINATES PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2003-10-09 WO disclosed