Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1974532 | 0.87 | LPAR2 (0.34) | LPAR2LPAR3 | |
| SCHEMBL11315152 | 0.83 | — | — | |
| SCHEMBL11160589 | 0.83 | — | — | |
| SCHEMBL11309359 | 0.82 | — | — | |
| SCHEMBL4098213 | 0.80 | — | — | |
| SCHEMBL11312224 | 0.80 | — | — | |
| SCHEMBL11737238 | 0.79 | PPARD (0.37) | — | |
| SCHEMBL11308534 | 0.79 | — | — | |
| SCHEMBL28909652 | 0.78 | — | — | |
| SCHEMBL11315351 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8536070-B2 | Vapor deposition of silicon dioxide nanolaminates | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2013-09-17 | — | — | US | disclosed |
| US-20110281417-A1 | VAPOR DEPOSITION OF SILICON DIOXIDE NANOLAMINATES | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2011-11-17 | — | — | US | disclosed |
| US-8008743-B2 | Vapor deposition of silicon dioxide nanolaminates | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2011-08-30 | — | — | US | disclosed |
| US-20050112282-A1 | Vapor deposition of silicon dioxide nanolaminates | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2005-05-26 | — | — | US | disclosed |
| EP-1490529-A1 | VAPOR DEPOSITION OF SILICON DIOXIDE NANOLAMINATES | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2004-12-29 | — | — | EP | disclosed |
| WO-2003083167-A1 | VAPOR DEPOSITION OF SILICON DIOXIDE NANOLAMINATES | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2003-10-09 | — | — | WO | disclosed |