SCHEMBL13588241

SCHEMBL13588241

C=C(C)C(=O)Oc1ccc(C)c2ccccc12

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HTT P42858 3/20 0.45
▸ ELANE P08246 1/20 0.45
▸ CYP1A2 P05177 2/20 0.45
▸ ESR1 P03372 3/20 0.41
▸ KMT2A Q03164 3/20 0.41
▸ ESR2 Q92731 3/20 0.41
▸ MEN1 O00255 2/20 0.41
▸ TSHR P16473 2/20 0.41
▸ PKM P14618 2/20 0.41
▸ NPC1 O15118 1/20 0.41
▸ RAB9A P51151 1/20 0.41
▸ MAPT P10636 3/20 0.38
▸ GAA P10253 3/20 0.38
▸ HSD17B10 Q99714 3/20 0.38
▸ KDM4E B2RXH2 1/20 0.38
▸ TP53 P04637 1/20 0.38
▸ LMNA P02545 3/20 0.38
▸ L3MBTL1 Q9Y468 1/20 0.38
▸ NCEH1 Q6PIU2 1/20 0.36
▸ PTPN1 P18031 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30226858 0.91 ELANE (0.51) HTTELANEESR1KMT2AESR2
SCHEMBL15302940 0.91 ELANE (0.51) HTTELANEESR1KMT2AESR2
SCHEMBL13588211 0.90 ESR1 (0.48) HTTELANECYP1A2ESR1KMT2A
SCHEMBL15302579 0.84 PLK1 (0.50) HTTELANECYP1A2ESR1KMT2A
SCHEMBL26022648 0.84 HTT (0.62) HTTCYP1A2ESR1KMT2AESR2
SCHEMBL10870084 0.83 ELANE (0.47) HTTELANEESR1KMT2AESR2
SCHEMBL4824369 0.83 ESR1 (0.49) HTTELANEESR1KMT2AESR2
SCHEMBL30226566 0.83 ESR1 (0.49) HTTELANEESR1KMT2AESR2
SCHEMBL13588239 0.82 ESR1 (0.41) HTTELANECYP1A2ESR1KMT2A
SCHEMBL18837420 0.81 HSD17B10 (0.47) HTTELANECYP1A2TSHRPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020116555-A1 LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL DISPLAY ELEMENT DIC株式会社 2020-06-11 — — WO disclosed
CN-105073807-A Curable resin composition, cured product, and optical article NIPPON STEEL & SUMIKIN CHEM CO 2015-11-18 — — CN disclosed
US-7629106-B2 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-08 — — US disclosed
US-7449277-B2 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL C., LTD (JP) 2008-11-11 — — US disclosed
US-20070111140-A1 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-17 — — US disclosed
US-20070072115-A1 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-29 — — US disclosed
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