SCHEMBL13588239

SCHEMBL13588239

C=C(C)C(=O)Oc1cccc2c(C)c(C)ccc12

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 6/20 0.41
▸ ESR2 Q92731 6/20 0.41
▸ KMT2A Q03164 5/20 0.41
▸ MEN1 O00255 4/20 0.41
▸ HTT P42858 2/20 0.39
▸ ELANE P08246 1/20 0.39
▸ POLB P06746 3/20 0.38
▸ GAA P10253 4/20 0.37
▸ ALDH1A1 P00352 3/20 0.37
▸ SMN1; SMN2 Q16637 3/20 0.37
▸ HSD17B10 Q99714 2/20 0.36
▸ ACHE P22303 1/20 0.36
▸ PGR P06401 1/20 0.36
▸ PTGS1 P23219 1/20 0.36
▸ MAPK1 P28482 1/20 0.36
▸ MAPT P10636 3/20 0.36
▸ JAK2 O60674 1/20 0.36
▸ USP2 O75604 1/20 0.36
▸ ALOX15 P16050 1/20 0.36
▸ NPSR1 Q6W5P4 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14973546 0.87 ELANE (0.45) ESR1ESR2KMT2AMEN1HTT
SCHEMBL10870084 0.87 ELANE (0.47) ESR1ESR2KMT2AMEN1HTT
SCHEMBL13588211 0.85 ESR1 (0.48) ESR1ESR2KMT2AMEN1HTT
SCHEMBL13588241 0.82 HTT (0.45) ESR1ESR2KMT2AMEN1HTT
SCHEMBL13588210 0.82 HTT (0.47) ESR1ESR2KMT2AMEN1HTT
SCHEMBL3192492 0.82 POLB (0.53) KMT2AMEN1ELANEPOLBGAA
SCHEMBL15302940 0.79 ELANE (0.51) ESR1ESR2KMT2AMEN1HTT
SCHEMBL30226858 0.79 ELANE (0.51) ESR1ESR2KMT2AMEN1HTT
SCHEMBL13588213 0.79 ELANE (0.40) ESR1ESR2KMT2AMEN1HTT
SCHEMBL72367 0.79 ESR1 (0.57) ESR1ESR2KMT2AMEN1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7629106-B2 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-08 — — US disclosed
US-7449277-B2 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL C., LTD (JP) 2008-11-11 — — US disclosed
US-20070111140-A1 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-17 — — US disclosed
US-20070072115-A1 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-29 — — US disclosed
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