⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1359093 | 0.84 | — | — | |
| SCHEMBL8997853 | 0.83 | — | — | |
| SCHEMBL15403667 | 0.79 | — | — | |
| SCHEMBL15402283 | 0.74 | — | — | |
| SCHEMBL2207962 | 0.74 | — | — | |
| SCHEMBL178331 | 0.74 | — | — | |
| SCHEMBL17061012 | 0.74 | — | — | |
| SCHEMBL28844448 | 0.72 | — | — | |
| SCHEMBL23174976 | 0.72 | — | — | |
| SCHEMBL15404294 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12183591-B2 | Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-12-31 | — | — | US | claimed |
| US-20220310407-A1 | ETCHING GAS COMPOSITIONS, METHODS OF FORMING MICROPATTERNS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE | Wonik Materials (KR) | 2022-09-29 | — | — | US | claimed |
| EP-0676458-B1 | WATER- AND OIL-REPELLENT COMPOSITION AND PROCESS FOR PRODUCING THE SAME | DAIKIN IND LTD (JP) | 2000-12-27 | — | — | EP | claimed |
| US-5608002-A | REPELLANTS FOR OIL OR WATER OF FLUOROCARBONS | DAIKIN INDUSTRIES, LTD. (JP) | 1997-03-04 | — | — | US | claimed |
| EP-0676458-A1 | WATER- AND OIL-REPELLENT COMPOSITION AND PROCESS FOR PRODUCING THE SAME | DAIKIN INDUSTRIES, LIMITED (JP) | 1995-10-11 | — | — | EP | claimed |
| US-5346645-A | Desiccant composition and a method of desiccating articles | DAIKIN INDUSTRIES, LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| JP-5214375-A | — | — | None | — | — | JP | disclosed |
| JP-6100891-A | — | — | None | — | — | JP | disclosed |
| US-12183591-B2 | Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-12-31 | — | — | US | disclosed |
| US-20240234031-A1 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR APPARATUS AND ELECTRONIC APPARATUS INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-07-11 | — | — | US | disclosed |
| CN-115873669-A | Rinsing agent and cleaning method of mask for OLED (organic light emitting diode) process | 三明市海斯福化工有限责任公司 | 2023-03-31 | — | — | CN | disclosed |
| US-20230084014-A1 | SOFT WATER- AND OIL-REPELLENT COMPRISING FLUORINE-CONTAINING POLYMER AS ACTIVE INGREDIENT | UNIMATEC CO., LTD. (JP) | 2023-03-16 | — | — | US | disclosed |
| US-11574821-B2 | Substrate treating method, substrate treating liquid and substrate treating apparatus | SCREEN Holdings Co., Ltd. | 2023-02-07 | — | — | US | disclosed |
| EP-0688860-A1 | PROCESS FOR PRODUCING CLEAN ARTICLE | DAIKIN INDUSTRIES, LIMITED (JP) | 1995-12-27 | — | — | EP | disclosed |
| EP-0676458-A1 | WATER- AND OIL-REPELLENT COMPOSITION AND PROCESS FOR PRODUCING THE SAME | DAIKIN INDUSTRIES, LIMITED (JP) | 1995-10-11 | — | — | EP | disclosed |
| EP-0516029-B1 | A method of desiccating articles | DAIKIN IND LTD (JP) | 1995-04-05 | — | — | EP | disclosed |
| US-5346645-A | Desiccant composition and a method of desiccating articles | DAIKIN INDUSTRIES, LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| JP-H06100891-A | SOLVENT OR ITS COMPOSITION | DAIKIN IND LTD | 1994-04-12 | — | — | JP | disclosed |
| JP-H05214375-A | 1H,2H,4H-PERFLUOROBUTANE-BASED CLEANING SOLVENT | ASAHI CHEM IND CO LTD | 1993-08-24 | — | — | JP | disclosed |
| EP-0516029-A1 | A method of desiccating articles | DAIKIN INDUSTRIES, LIMITED (JP) | 1992-12-02 | — | — | EP | disclosed |