SCHEMBL13595160

SCHEMBL13595160

CC(=O)CCCCc1ccccc1C

nearest known ligand 0.59

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ FPR2 P25090 1/20 0.50
▸ CYP4F2 P78329 1/20 0.47
▸ CYP4A11 Q02928 1/20 0.47
▸ TAAR1 Q96RJ0 1/20 0.47
▸ ALDH1A1 P00352 4/20 0.46
▸ NOTUM Q6P988 1/20 0.46
▸ LMNA P02545 1/20 0.44
▸ IAPP P10997 1/20 0.43
▸ HDAC1 Q13547 1/20 0.42
▸ MAOB P27338 1/20 0.41
▸ SLC16A3 O15427 1/20 0.41
▸ HPGD P15428 2/20 0.41
▸ CTBP2 P56545 1/20 0.41
▸ TP53 P04637 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30697416 1.00 FPR2 (0.50) FPR2CYP4F2CYP4A11TAAR1ALDH1A1
SCHEMBL9394677 0.86 CYP4F2 (0.51) CYP4F2CYP4A11ALDH1A1LMNAIAPP
SCHEMBL1404957 0.86 IAPP (0.56) FPR2CYP4F2CYP4A11TAAR1ALDH1A1
SCHEMBL29843018 0.86 IAPP (0.56) FPR2CYP4F2CYP4A11TAAR1ALDH1A1
SCHEMBL4253986 0.85 MAPT (0.56) CYP4F2CYP4A11TAAR1ALDH1A1HDAC1
SCHEMBL711830 0.84 MAPT (0.59) HDAC1
SCHEMBL26216135 0.82 CYP4F2 (0.45) CYP4F2CYP4A11TAAR1ALDH1A1NOTUM
SCHEMBL6546757 0.82 TAAR1 (0.65) TAAR1ALDH1A1LMNASLC16A3HPGD
SCHEMBL14935706 0.81 IAPP (0.56) CYP4F2CYP4A11TAAR1ALDH1A1IAPP
SCHEMBL22418800 0.81 TAAR1 (0.50) CYP4F2CYP4A11TAAR1ALDH1A1NOTUM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116710500-A Polymer, composition, method for producing polymer, composition for forming film, resist composition, method for forming resist pattern, radiation-sensitive composition, composition for forming underlayer film for lithography, method for producing underlayer film for lithography, method for forming circuit pattern, and composition for forming optical member 三菱瓦斯化学株式会社 2023-09-05 — — CN disclosed
EP-2130538-A1 Use of a cholinesterase inhibitor for the delaying the onset of Alzheimer's disease Eisai R&D Management Co., Ltd. (JP) 2009-12-09 — — EP disclosed
Send feedback