⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12020546 | 1.00 | — | — | |
| SCHEMBL22129524 | 0.91 | HSD17B10 (0.38) | — | |
| 2-Methoxyethanol SCHEMBL22129522 | 0.89 | USP2 (0.34) | — | |
| SCHEMBL20295231 | 0.87 | HSD17B10 (0.34) | — | |
| SCHEMBL19257468 | 0.85 | MAPT (0.40) | — | |
| SCHEMBL1521343 | 0.84 | — | — | |
| SCHEMBL4916254 | 0.82 | GPR84 (0.47) | — | |
| SCHEMBL10513780 | 0.81 | HSD17B10 (0.61) | — | |
| SCHEMBL17233052 | 0.81 | — | — | |
| SCHEMBL8016289 | 0.81 | HSD17B10 (0.61) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1682 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026104842-A1 | CLEANING AND MARKING COMPOSITION | TRISTEL PLC (GB) | 2026-05-21 | — | — | WO | claimed |
| CN-119679667-A | Perfume combined with magnetic fluid flash powder, preparation method thereof and aromatherapy device | 广东香百年控股集团有限公司 | 2025-03-25 | — | — | CN | claimed |
| WO-2025032169-A1 | POSITIVE TONE PATTERNS FROM METAL ORGANIC RESISTS | MERCK PATENT GMBH (DE) | 2025-02-13 | — | — | WO | claimed |
| WO-2023075664-A1 | A DISINFECTANT FILM-FORMING COMPOSITION AND A DRY DISINFECTANT FILM FORMED ON A SURFACE FROM THE FILM FORMING COMPOSITION | Rise Research Institutes of Sweden AB (SE) | 2023-05-04 | — | — | WO | claimed |
| CN-115429711-A | A high concentration stable salicylic acid composition capable of contacting skin and its preparation method | 上海美浮特生物科技有限公司 | 2022-12-06 | — | — | CN | claimed |
| US-11249395-B2 | Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film | FUJIFILM CORPORATION (JP) | 2022-02-15 | — | — | US | claimed |
| CN-112972689-A | Anti-acne composition containing antibiotics and alcohol compounds or vegetable oil | 黄泳华 | 2021-06-18 | — | — | CN | claimed |
| CN-111748414-A | Cleaning method for semiconductor device after gold-tin soldering | 中国科学院苏州纳米技术与纳米仿生研究所广东(佛山)研究院 | 2020-10-09 | — | — | CN | claimed |
| CN-111744870-A | Cleaning method for semiconductor device after gold-tin soldering | 中国科学院苏州纳米技术与纳米仿生研究所广东(佛山)研究院 | 2020-10-09 | — | — | CN | claimed |
| US-20200183284-A1 | METHOD AND COMPOSITION FOR IMPROVING LWR IN PATTERNING STEP USING NEGATIVE TONE PHOTORESIST | YCCHEM CO., LTD. (KR) | 2020-06-11 | — | — | US | claimed |
| US-20040009883-A1 | Resist stripping composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-15 | — | — | US | claimed |
| EP-1331229-A1 | Fluoropolymers and processes therefor and therewith | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-07-30 | — | — | EP | claimed |
| US-6596829-B1 | Mold release agent or lubricant and is disclosed. The composition comprises a fluorotelomer, which comprises repeat units derived from a fluoroalkene, and optionally a comonomer, and has an end group derived from a secondary alcohol or | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-07-22 | — | — | US | claimed |
| CN-1085681-C | Isolation of novolak resins by cryogenic sub-surface forced steam distillation | CLARIANT FINANCIAL BVI LTD (VG) | 2002-05-29 | — | — | CN | claimed |
| CN-1316444-A | Producing method of semiconductor device | KORLAEN FINANCE BVI CO LTD (VG) | 2001-10-10 | — | — | CN | claimed |
| EP-0800542-B1 | ISOLATION OF NOVOLAK RESIN BY LOW TEMPERATURE SUB-SURFACE FORCED STEAM DISTILLATION | CLARIANT FINANCE BVI LTD (VG) | 1998-08-19 | — | — | EP | claimed |
| US-5750632-A | Isolation of novolak resin by low temperature sub surface forced steam distillation | CLARIANT FINANCE (BVI) LIMITED (VG) | 1998-05-12 | — | — | US | claimed |
| CN-1171800-A | Isolation of novolak resins by cryogenic sub-surface forced steam distillation | HOECHST CELANESE CORP (US) | 1998-01-28 | — | — | CN | claimed |
| EP-0800542-A1 | ISOLATION OF NOVOLAK RESIN BY LOW TEMPERATURE SUB-SURFACE FORCED STEAM DISTILLATION | HOECHST CELANESE CORPORATION (US) | 1997-10-15 | — | — | EP | claimed |
| WO-1996021211-A1 | ISOLATION OF NOVOLAK RESIN BY LOW TEMPERATURE SUB-SURFACE FORCED STEAM DISTILLATION | HOECHST CELANESE CORPORATION (US) | 1996-07-11 | — | — | WO | claimed |