SCHEMBL13609105

SCHEMBL13609105

Cc1cc(C(C)(c2ccc(OCc3cc(O)cc(O)c3)cc2)c2cc(C(C)(c3ccc(OCc4cc(O)cc(O)c4)cc3)c3ccc(OCc4cc(O)cc(O)c4)cc3)cc(C(C)(c3ccc(OCc4cc(O)cc(O)c4)cc3)c3ccc(OCc4cc(O)cc(O)c4)cc3)c2)ccc1OCc1cc(O)cc(O)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MRGPRX4 Q96LA9 3/20 0.44
▸ PPARD Q03181 12/20 0.42
▸ PPARA Q07869 2/20 0.42
▸ FFAR1 O14842 1/20 0.40
▸ FFAR4 Q5NUL3 1/20 0.40
▸ PPARG P37231 1/20 0.39
▸ TUBB4A P04350 1/20 0.38
▸ TUBB P07437 1/20 0.38
▸ TUBA3C P0DPH7 1/20 0.38
▸ TUBA1B P68363 1/20 0.38
▸ TUBA4A P68366 1/20 0.38
▸ TUBB4B P68371 1/20 0.38
▸ TUBB3 Q13509 1/20 0.38
▸ TUBB2A Q13885 1/20 0.38
▸ TUBB8 Q3ZCM7 1/20 0.38
▸ TUBA3E Q6PEY2 1/20 0.38
▸ TUBA1A Q71U36 1/20 0.38
▸ TUBA1C Q9BQE3 1/20 0.38
▸ TUBB6 Q9BUF5 1/20 0.38
▸ TUBB2B Q9BVA1 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14461958 0.89 APP (0.45) PPARDPPARAPPARGTUBB4ATUBB
SCHEMBL14422350 0.86 APP (0.47) PPARDPPARAPPARGTUBB4ATUBB
SCHEMBL14422352 0.82 APP (0.44) PPARDPPARAPPARGTUBB4ATUBB
SCHEMBL14456128 0.82 APP (0.44) PPARDPPARAPPARGTUBB4ATUBB
SCHEMBL2611705 0.80 PARP10 (0.53) MRGPRX4PPARDPPARAPPARGPARP10
SCHEMBL14456121 0.77 PARP10 (0.55) MRGPRX4PPARDPPARAPPARGPARP10
SCHEMBL14456179 0.73 APP (0.55) APP
SCHEMBL14456177 0.73 APP (0.44) PPARDPPARAPPARGESR1APP
SCHEMBL14456122 0.73 PARP10 (0.51) PPARDPPARAPPARGPARP10APP
SCHEMBL13592454 0.71 GSTP1 (0.38) PPARDPPARAPPARGAPP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7615330-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-11-10 — — US disclosed
US-7615330-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-11-10 — — US disclosed
US-20070224540-A1 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-09-27 — — US disclosed
US-20070224540-A1 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-09-27 — — US disclosed
Send feedback