SCHEMBL13609233

SCHEMBL13609233

CCC(C)(C)C(=O)OCC(C)C(=O)OC1(CC)C2CC3CC(C2)CC1C3

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12107900 0.84
SCHEMBL47435 0.83 CYP17A1 (0.34)
SCHEMBL47472 0.81 CYP17A1 (0.30)
SCHEMBL683427 0.80 ALDH1A1 (0.34)
SCHEMBL47481 0.79 EPHX2 (0.32)
SCHEMBL47449 0.79 EPHX2 (0.32)
SCHEMBL25834724 0.78 HMGCR (0.30) HMGCR
SCHEMBL16904891 0.77 EPHX2 (0.33)
SCHEMBL13609227 0.77 EPHX2 (0.35)
SCHEMBL13609231 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7622242-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-24 US disclosed
US-20090081588-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-26 US disclosed