⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13616616 | 0.90 | — | — | |
| SCHEMBL13616614 | 0.89 | — | — | |
| SCHEMBL13616635 | 0.89 | — | — | |
| SCHEMBL12130163 | 0.88 | — | — | |
| SCHEMBL13042775 | 0.88 | TSHR (0.33) | — | |
| SCHEMBL12977727 | 0.87 | OPRM1 (0.32) | — | |
| SCHEMBL12416009 | 0.85 | — | — | |
| SCHEMBL13616612 | 0.85 | FABP7 (0.31) | — | |
| SCHEMBL13616579 | 0.84 | — | — | |
| SCHEMBL13616620 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9395625-B2 | Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2016-07-19 | — | — | US | disclosed |
| US-9395625-B2 | Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2016-07-19 | — | — | US | disclosed |
| US-20150037733-A1 | ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |
| US-20150037733-A1 | ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |
| US-20090286937-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20090286937-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-11-19 | — | — | US | disclosed |