SCHEMBL13628806

SCHEMBL13628806

CC1CCC(=O)S1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21648136 0.84
SCHEMBL13628804 0.84
SCHEMBL19743730 0.67
SCHEMBL4897279 0.67
SCHEMBL19300615 0.67
SCHEMBL13628802 0.67
SCHEMBL728703 0.67
SCHEMBL19180220 0.65
Hydrochloric Acid SCHEMBL5848795 0.65
SCHEMBL21648215 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4240579-B1 METHOD FOR MAKING PHOTOCHROMIC CONTACT LENSES ALCON INC (CH) 2024-12-04 EP claimed
EP-4240579-A1 METHOD FOR MAKING PHOTOCHROMIC CONTACT LENSES Alcon Inc. (CH) 2023-09-13 EP claimed
WO-2022097049-A1 METHOD FOR MAKING PHOTOCHROMIC CONTACT LENSES ALCON INC. (CH) 2022-05-12 WO claimed
CN-119015319-A Compound paracetamol and amantadine hydrochloride capsules and preparation method thereof 重庆申高生化制药股份有限公司 2024-11-26 CN disclosed
EP-4240579-A1 METHOD FOR MAKING PHOTOCHROMIC CONTACT LENSES Alcon Inc. (CH) 2023-09-13 EP disclosed
WO-2022097049-A1 METHOD FOR MAKING PHOTOCHROMIC CONTACT LENSES ALCON INC. (CH) 2022-05-12 WO disclosed
US-20200031796-A1 COMPOSITION COMPRISING A COMPOUND OF THIOLACTONE TYPE AND A PARTICULAR SOLVENT AND PROCESS FOR TREATING KERATIN MATERIALS WITH THE COMPOSITION L'OREAL (FR) 2020-01-30 US disclosed
US-20200030215-A1 AQUEOUS COMPOSITION COMPRISING A COMPOUND OF THIOLACTONE TYPE AND A SILICONE AND PROCESS FOR TREATING KERATIN MATERIALS WITH THE COMPOSITION L'OREAL (FR) 2020-01-30 US disclosed
US-9547240-B2 Resin, photoresist composition, and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-01-17 US disclosed
US-20150147695-A1 RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-05-28 US disclosed
US-7612070-B2 Heterocyclic compounds as antiinflammatory agents and cyclooxygenase inhibitors CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2009-11-03 US disclosed
US-7612070-B2 Heterocyclic compounds as antiinflammatory agents and cyclooxygenase inhibitors CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2009-11-03 US disclosed