SCHEMBL13630426

SCHEMBL13630426

C=C(C(=O)OCC(=O)OC1OC2C(C)OC(=O)C2C1C(=O)OCC(F)(F)F)C(F)(F)F

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
FABP7 O15540 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13630702 0.91 FABP7 (0.31) FABP7
SCHEMBL13630772 0.89
SCHEMBL13630422 0.87
SCHEMBL13630446 0.86 FABP7 (0.31) FABP7
SCHEMBL13630771 0.85
SCHEMBL13630627 0.85
SCHEMBL13630633 0.85
SCHEMBL13630631 0.84 LMNA (0.34)
SCHEMBL13630456 0.84
SCHEMBL13630429 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090286937-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-11-19 US disclosed