SCHEMBL13635802

SCHEMBL13635802

COc1[nH]c(=O)n(-c2ccccc2)c(=O)c1/C=C/C(C)=C/C=C1/C(=O)NC(=O)N(c2ccccc2)C1=O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 8/20 0.43
▸ MEN1 O00255 8/20 0.43
▸ KMT2A Q03164 8/20 0.43
▸ ALDH1A1 P00352 7/20 0.43
▸ HPGD P15428 3/20 0.43
▸ PKM P14618 3/20 0.43
▸ MAPK1 P28482 3/20 0.43
▸ NPSR1 Q6W5P4 3/20 0.43
▸ L3MBTL1 Q9Y468 3/20 0.43
▸ KDM4E B2RXH2 2/20 0.43
▸ POLB P06746 2/20 0.43
▸ LMNA P02545 1/20 0.43
▸ NTSR1 P30989 1/20 0.43
▸ ITGA4 P13612 5/20 0.43
▸ ITGB7 P26010 5/20 0.43
▸ PSMD14 O00487 1/20 0.43
▸ MMP2 P08253 1/20 0.43
▸ THRB P10828 1/20 0.43
▸ PPARG P37231 1/20 0.43
▸ NCOA2 Q15596 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20143530 0.88 MAPT (0.40) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL13109101 0.88 MAPT (0.46) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL13934174 0.88 MAPT (0.46) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL13476277 0.83 KMT2A (0.47) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL23432909 0.76 MAPT (0.45) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL23432910 0.73 MEN1 (0.42) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL14039472 0.72 MAPT (0.55) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL20115503 0.71 ITGA4 (0.44) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL13476253 0.71 KMT2A (0.38) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL16810155 0.70 POLB (0.34) MAPTMEN1KMT2AALDH1A1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1041433-B1 Heat-developable photosensitive material and method for forming image using the same FUJIFILM CORP (JP) 2009-11-25 — — EP disclosed
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