Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 11/20 | 0.64 |
| ▸ | KDM1A | O60341 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.40 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.36 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.36 |
| ▸ | RXRA | P19793 | 1/20 | 0.36 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.36 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.36 |
| ▸ | MAPKAPK2 | P49137 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26214961 | 0.94 | ELANE (0.57) | ELANEKDM1ARAB9ACA2MEN1 | |
| SCHEMBL4061370 | 0.87 | ELANE (0.81) | ELANEKDM1ARAB9ACA2MEN1 | |
| SCHEMBL8322957 | 0.81 | ELANE (0.54) | ELANEKDM1ARAB9ACA2MEN1 | |
| SCHEMBL8323431 | 0.81 | ELANE (0.54) | ELANEKDM1ARAB9ACA2MEN1 | |
| SCHEMBL4059798 | 0.81 | ELANE (0.72) | ELANEKDM1ARAB9ACA2MEN1 | |
| SCHEMBL7195555 | 0.79 | ELANE (0.70) | ELANEKDM1ACA2MEN1KMT2A | |
| SCHEMBL4057059 | 0.79 | ELANE (0.70) | ELANEKDM1ACA2MEN1KMT2A | |
| SCHEMBL1792031 | 0.78 | ELANE (0.68) | ELANEKDM1ACA2MEN1KMT2A | |
| SCHEMBL4065322 | 0.78 | ELANE (0.68) | ELANEKDM1ARAB9ACA2MEN1 | |
| SCHEMBL7195551 | 0.78 | ELANE (0.68) | ELANEKDM1ARAB9ACA2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7598182-B2 | having monomers of pyromellitic acid, 3,5-diaminobenzoic acid; use in a lithography for forming photoresist pattern | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-20070004228-A1 | Polyamide acid-containing composition for forming antireflective film | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-04 | — | — | US | disclosed |